Advances in Imaging and Electron Physics
Academic Press Inc (Verlag)
978-0-12-374220-9 (ISBN)
The invention of the electron microscope more than 70 years ago made it possible to visualize a new world, far smaller than anything that could be seen with the traditional microscope. The biologist could study viruses and the components of cells, the materials scientist could study the structure of metals and alloys and many other substances, and especially their defects. But even the electron microscope had limits, and truly atomic structure was still too small to be observed directly. The so-called "limit of resolution" of the microscope was well understood, but attempts to use the necessary correctors were unsuccessful until the late 1990s. Such correctors now equip many microscopes in Europe, the USA and Japan and the results are extremely impressive. Moreover, microscopists feel that they are only at the beginning of a new era of subatomic microscopic imaging. In the present volume, we have brought together the principal contributors, instrument designers and microscopists to discuss this topic in depth.
Peter Hawkes obtained his M.A. and Ph.D (and later, Sc.D.) from the University of Cambridge, where he subsequently held Fellowships of Peterhouse and of Churchill College. From 1959 – 1975, he worked in the electron microscope section of the Cavendish Laboratory in Cambridge, after which he joined the CNRS Laboratory of Electron Optics in Toulouse, of which he was Director in 1987. He was Founder-President of the European Microscopy Society and is a Fellow of the Microscopy and Optical Societies of America. He is a member of the editorial boards of several microscopy journals and serial editor of Advances in Electron Optics.
History of aberration correction in electron microscopy (H. Rose)Present and future hexapole aberration correctors for high resolution electron microscopy (M. Haider)Aberration correction and STEM (O.L. Krivanek)First results using the Nion third order STEM corrector (P. Batson) STEM and EELS: Mapping materials atom by atom (A.B. Bleloch) Aberration correction with the SACTEM-Toulouse: from imaging to diffraction (F. Houdellier et al.) Novel aberration corrections concepts (B. Kabius) Aberration corrected imaging in CTEM and STEM (A. Kirkland et al.)Materials applications of aberration-corrected STEM (S.J. Pennycook et al.)Spherical aberration corrected transmission electron microscopy for nanomaterials in Japan (N. Tanaka)Atomic-resolution aberration-corrected transmission electron microscopy (K. Urban et al.) Aberration-corrected electron microscopes at Brookhaven National Laboratory (Y. Zhu and J. Wall)
| Erscheint lt. Verlag | 18.12.2008 |
|---|---|
| Reihe/Serie | Advances in Imaging and Electron Physics |
| Mitarbeit |
Herausgeber (Serie): Peter W. Hawkes |
| Verlagsort | San Diego |
| Sprache | englisch |
| Maße | 152 x 229 mm |
| Gewicht | 1040 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| ISBN-10 | 0-12-374220-X / 012374220X |
| ISBN-13 | 978-0-12-374220-9 / 9780123742209 |
| Zustand | Neuware |
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