Spacer Engineered FinFET Architectures
High-Performance Digital Circuit Applications
Seiten
2017
Crc Press Inc (Verlag)
978-1-4987-8359-0 (ISBN)
Crc Press Inc (Verlag)
978-1-4987-8359-0 (ISBN)
This book focusses on the spacer engineering aspects of novel MOS-based device–circuit co-design in sub-20nm technology node, its process complexity, variability, and reliability issues. It comprehensively explores the FinFET/tri-gate architectures with their circuit/SRAM suitability and tolerance to random statistical variations.
Sudeb Dasgupta, Brajesh Kumar Kaushik, Pankaj Kumar Pal
Preface
About the Authors
Chapter 1 ◾ Introduction to Nanoelectronics
Chapter 2 ◾ Tri-Gate FinFET Technology and Its Advancement
Chapter 3 ◾ Dual-k Spacer Device Architecture and Its Electrostatics
Chapter 4 ◾ Capacitive Analysis and Dual-k FinFET-Based Digital Circuit Design
Chapter 5 ◾ Design Metric Improvement of a Dual-k–Based SRAM Cell
Chapter 6 ◾ Statistical Variability and Sensitivity Analysis
INDEX
Erscheinungsdatum | 22.06.2017 |
---|---|
Zusatzinfo | 3 Tables, black and white; 14 Halftones, black and white; 39 Illustrations, color; 49 Illustrations, black and white |
Verlagsort | Bosa Roca |
Sprache | englisch |
Maße | 156 x 234 mm |
Gewicht | 430 g |
Themenwelt | Technik ► Elektrotechnik / Energietechnik |
Technik ► Umwelttechnik / Biotechnologie | |
ISBN-10 | 1-4987-8359-7 / 1498783597 |
ISBN-13 | 978-1-4987-8359-0 / 9781498783590 |
Zustand | Neuware |
Haben Sie eine Frage zum Produkt? |
Mehr entdecken
aus dem Bereich
aus dem Bereich
Kolbenmaschinen - Strömungsmaschinen - Kraftwerke
Buch | Hardcover (2023)
Hanser (Verlag)
49,99 €