Subsecond Annealing of Advanced Materials -

Subsecond Annealing of Advanced Materials

Annealing by Lasers, Flash Lamps and Swift Heavy Ions
Buch | Softcover
XVII, 321 Seiten
2016 | 1. Softcover reprint of the original 1st ed. 2014
Springer International Publishing (Verlag)
978-3-319-35287-9 (ISBN)
53,49 inkl. MwSt
This book examines thermal processing of elemental semiconductors and materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Covers compound semiconductors, dielectric composites and organic materials.
The thermal processing of materials ranges from few fem to seconds by Swift Heavy Ion Implantation to about one second using advanced Rapid Thermal Annealing. This book offers after an historical excursus selected contributions on fundamental and applied aspects of thermal processing of classical elemental semiconductors and other advanced materials including nanostructures with novel optoelectronic, magnetic, and superconducting properties. Special emphasis is given on the diffusion and segregation of impurity atoms during thermal treatment. A broad range of examples describes the solid phase and/or liquid phase processing of elemental and compound semiconductors, dielectric composites and organic materials.

From the Contents: The very early time.- Nanonet formation by constitutional supercooling of pulsed laser annealed, Mn-implanted germanium.- Metastable activation of dopants by solid phase epitaxial recrystallization.- Superconducting Ga-implanted Germanium.- Structural changes in SiGe/Si layers induced by fast crystallization.

Erscheinungsdatum
Reihe/Serie Springer Series in Materials Science
Zusatzinfo XVII, 321 p. 205 illus., 59 illus. in color.
Verlagsort Cham
Sprache englisch
Maße 155 x 235 mm
Themenwelt Technik Elektrotechnik / Energietechnik
Technik Maschinenbau
Schlagworte Activation of Dopants • Annealing by Swift Heavy Ions • Chemistry and Materials Science • Condensed matter physics (liquid state and solid s • Electronic devices and materials • Epitaxial Growth of Silicon • Explosive Crystallisation • Flash Lamp Annealing • Laser technology and holography • Laser Technology, Photonics • Microwaves, RF and Optical Engineering • Microwave technology • optical and electronic materials • Pulsed Laser Annealing • Radiation Thermometry • semiconductors • Sub-second Annealing • Surface and Interface Science, Thin Films • Thermal Processing of Materials • Thermal Spike-induced Nanostructuring
ISBN-10 3-319-35287-3 / 3319352873
ISBN-13 978-3-319-35287-9 / 9783319352879
Zustand Neuware
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