High Density Plasma Sources - Oleg A. Popov

High Density Plasma Sources

Design, Physics and Performance

(Autor)

Buch | Hardcover
465 Seiten
1996
William Andrew Publishing (Verlag)
978-0-8155-1377-3 (ISBN)
176,95 inkl. MwSt
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Describes the design, physics, and performance of high density plasma sources which have been explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and other applications.
This book describes the design, physics, and performance of high density plasma sources which have been extensively explored in low pressure plasma processing, such as plasma etching and planarization, plasma enhanced chemical vapor deposition of thin films, sputtered deposition of metals and dielectrics, epitaxial growth of silicon and GaAs, and many other applications. This is a comprehensive survey and a detailed description of most advanced high density plasma sources used in plasma processing. The book is a balanced presentation in that it gives both a theoretical treatment and practical applications. It should be of considerable interest to scientists and engineers working on plasma source design, and process development.

Helicon Plasma SourcesPlanar Inductive SourcesElectrostatically-Shielded Inductively-Coupled RF Plasma SourcesVery High Frequency Capacitive Plasma SourcesSurface Wave Plasma SourcesMicrowave Plasma Disk Processing MachinesElectron Cyclotron Resonance Plasma SourcesDistributed ECR Plasma SourcesReferencesIndex

Erscheint lt. Verlag 31.12.1996
Verlagsort Norwich
Sprache englisch
Maße 152 x 229 mm
Gewicht 880 g
Themenwelt Naturwissenschaften Physik / Astronomie Plasmaphysik
Technik
ISBN-10 0-8155-1377-1 / 0815513771
ISBN-13 978-0-8155-1377-3 / 9780815513773
Zustand Neuware
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