Protection for Semiconductor Chip Masks in the United States

Analysis of the Semiconductor Chip Protection Act of 1984
V, 99 Seiten
1986
Wiley-VCH (Hersteller)
978-3-527-26003-4 (ISBN)

Lese- und Medienproben

Protection for Semiconductor Chip Masks in the United States - D Ladd, D E Leibowitz, G Joseph Bruce
39,90 inkl. MwSt
  • Titel ist leider vergriffen;
    keine Neuauflage
  • Artikel merken
Three experts describe the scope of protection provided by the Semiconductor Chip Protection Act of 1984 and the conditions imposed on eligibility for protection.
Three experts describe the scope of protection provided by the Semiconductor Chip Protection Act of 1984 and the conditions imposed on eligibility for protection. They also discuss substantive and procedural issues raised by the Act, its legislative history, and the appertaining regulations promulgated by the US Copyright Office. Of particular interest to the international practitioner is the book's comprehensive discussion of protection for mask works not first commercially exploited in the United States and of the avenues available for protection of mask works developed outside the United States. The authors' explanation, by textual analysis, of the provisions of this new law and the guidelines given are indispensable aids for everybody concerned with this topic.

Introduction; Technological Background; Overview of the Act; Mask Works; Exclusive Rights; Term of Protection; Conditions for Protection; Retroactivity; Limitations on Exclusive Rights; Remedies; Issues Raised by the Act; Protection for Non-U.S. Mask Works; The Relationship of the Chip Act to Other U.S. Intellectual Property Laws; Registration, Deposit and Mask Work Notice; The Standards of Originality and Creativity; The Reverse Engineering Limitation on Exclusive Mask Work Rights; Conclusion; Appendix; Semiconductor Chip Protection Act of 1984; Explanatory Memorandum_Mathias-Leary Amendment; Mask Work Protection; Implementation of the Semiconductor Chip Protection Act of 1984 (Copyright Office Final Regulations); Guidelines for the Submission of Applications for Interim Protection of Mask Works.

Reihe/Serie IIC-Studies ; 8
Verlagsort Weinheim
Sprache deutsch
Einbandart Paperback
Themenwelt Recht / Steuern EU / Internationales Recht
Recht / Steuern Wirtschaftsrecht Urheberrecht
Technik Elektrotechnik / Energietechnik
Wirtschaft
ISBN-10 3-527-26003-X / 352726003X
ISBN-13 978-3-527-26003-4 / 9783527260034
Zustand Neuware
Haben Sie eine Frage zum Produkt?