EMLC 2008

The three-day conference is dedicated to the science, technology, engineering and application of mask and lithography technologies and associated processes, and gives an overview of the present status in mask and lithography technologies and the future strategy where mask producers and users have the opportunity to become acquainted with new developments and results. This years sessions included: "Double Patterning”, “Simulation”, “Mask Business & Mask Data Prep”, “Mask Cleaning & Haze”, Inspection & Repair”, “Resist”, “Metrology”, “RET”, “EUV” and “NIL”. A small Poster Session was also included.