Nanofabrication
Principles, Capabilities and Limits
Seiten
2008
|
2008 ed.
Springer-Verlag New York Inc.
978-0-387-75576-2 (ISBN)
Springer-Verlag New York Inc.
978-0-387-75576-2 (ISBN)
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Provides the reader with the information and development in the Nanofabrication area. This book presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. It is suitable for those working in nanostructure fabrication.
This book provides the reader with the most up-to-date information and development in the Nanofabrication area. It presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The book serves as a practical guide and first hand reference for those working in nanostructure fabrication.
This book provides the reader with the most up-to-date information and development in the Nanofabrication area. It presents a one-stop description at the introduction level on most of the technologies that have been developed which are capable of making structures below 100nm. Principles of each technology are introduced and illustrated with minimum mathematics involved. The book serves as a practical guide and first hand reference for those working in nanostructure fabrication.
Nanofabrication by Photons.- Nanofabrication by Charged Beams.- Nanofabrication by Scanning Probes.- Nanofabrication by Replication.- Nanoscale Pattern Transfer.- Indirect Nanofabrication.- Nanofabrication by Self-Assembly.
Zusatzinfo | 177 black & white illustrations, 20 black & white tables, biography |
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Verlagsort | New York, NY |
Sprache | englisch |
Maße | 156 x 234 mm |
Gewicht | 1500 g |
Themenwelt | Technik ► Maschinenbau |
ISBN-10 | 0-387-75576-4 / 0387755764 |
ISBN-13 | 978-0-387-75576-2 / 9780387755762 |
Zustand | Neuware |
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