Thin Film Optical Coatings for Effective Solar Energy Utilization
Nova Science Publishers Inc (Verlag)
978-1-60021-643-5 (ISBN)
The subject of the book is CVD thin film optical coatings for application in photothermal solar energy conversion. The specific character of the materials research in the area of thermal solar energy conversion is the necessity of large areas for interception of the solar flux. The interceptive surfaces meeting the solar flux are mainly thin film (for cost effective purposes) coatings and the price of their production should be very low. Besides they must withstand high temperatures reaching in some applications 500 degrees C, and the film should be stable for a long time (15-20 years). The possible diffusion processes lead to structure changes in thin films and deterioration of optical properties. These coatings differ from the ones for thin film optics, where the applications are basically at room temperature. These coatings differ also from the microelectronics materials, where miniaturisation lowered the price.
Preface; APCVD Spectrally Selective Surfaces; Optical Properties of Cermet Materials APCVD Spectrally Selective Surfaces C Black Molybdenum Solar Absorbers; The effective dielectric function for a heterogeneous material; Effective Medium Theories; Maxwell Garnet; Bruggeman; Other Effective Medium Theories; Bounds on the Effective Dielectric Function; Wiener Absolute Bounds; More Stringent Bounds based on General Macroscopic Attributes; The reflectance of a Cermet Material; Spectral profile of the absorptance for an ideal photothermal converter surface; Optical profile of the energy flux of solar input for three concentrations, and of reradiation loss at three converter temperatures; The Spectral Selectivity of Mo-MoO2 Cermet; Figures of Merit for Real Spectrally Selective Surfaces; The Spectral Selectivity of Mo-MoO2 Cermet; 4.1 Figures of Merit for Real Spectrally Selective Surfaces; Limits on the allowed range of at 0.5m and 5m, for a cermet composed of 60% Mo and 40% MoO2; 5. Chemical Vapor Deposition (CVD) technology; Why molybdenum for spectrally selective surfaces; APCVD technology of Oxychloride and Carbonyl Black Molybdenum; Dioxydichloride chemical vapor deposition process; Black Molybdenum Films Characterization; Auger Electron Spectroscopy for chemical composition determination and microprobe analysis; Experimental results from chemical composition study; Structural characterization of Black molybdenum coatings; Transmission Electron Microscopy of Oxychloride Black Molybdenum; Optical Spectrophotometry measurements; Measurement of Infrared Reflectance in 2.5 - 15 |Im range and calculation of Thermal emittance of Black molybdenum coatings; Graded index profile black Mo; Thickness optimization; CVD silicon nitride protective and antireflecting coating for black molybdenum solar absorbers; Carbonyl black molybdenum spectrally selective surfaces (CBM); Experimental set-up for the carbonyl black molybdenum; Post deposition anneal of the films; Discussion of Optical Properties of Black Molybdenum Films; Comparison of the Physical Properties of Carbonyl and Oxychloride films; Interpretation of the results in terms of the Bounds on the Effective Dielectric Function; Enhancement of selectivity due to Surface Texture; Graded-index multilayer approach to match the theory with experiment; Applications of black molybdenum solar absorber coatings; Black Molybdenum Thin Films in Photothermal Solar Energy Conversion; The requirements of Photothermal Conversion; CVD Black Molybdenum in Photothermal Converters; Extended Lifetime-stability tests of Black Molybdenum Films deposited on Metal Substrates; Electrochromism, Materials and Applications; Electrochromism; Electrochromic characteristics and mechanisms; Electrochromic materials; Applications of electrochromic devices; Main principles of cyclic voltammetry; Experimental conditions for electrochromic investigations of CVD thin films; References of Chapter 2; Technology Development and Properties of APCVD WO3 Electrochromic Thin Films; Technology development of low-temperature APCVD carbonyl process for deposition of WO3 thin films; Investigation of Structure and Optical Properties of APCVD WO3 films; Investigation of Composition of CVD-WO3 films; Study of Structure of APCVD-WO3 films; Vibrational properties of CVD-WO3 films; Optical properties of CVD-WO3 films; Electrochromic behavior of CVD grown tungsten oxide ?lms; CVD Molybdenum Oxide Thin Films as Electrochromic Material; Introduction; Crystal Structures of MoO3; 2B. CVD preparation of MoO3 thin films; Raman Spectroscopy of molybdenum oxide thin films; Investigation of CVD mixed oxide films based on molybdenum and tungsten; Applications of mixed oxide system; Technological parameters for CVD preparation of thin films of WxMo1-xO3; Auger analysis of mixed oxide films on the basis of Mo and W obtained by CVD method; 4. Surface morphology of APCVD MoO3, WO3 and Mo/W oxide films; Investigation of MoO3-WO3 films, obtained from the separate precursors; Electrochromic cell prototype; Conclusions; Investigation of CVD obtained Thin Films of Chromium Oxide; Applications of chromium oxide; Technological deposition conditions; XRD analysis of Cr2O3 films; Transmission electron microscopy of Cr2O3 thin films; AFM study of CVD Cr2O3 thin films; IR investigation of Cr2O3 thin films; Raman spectroscopy investigation of chromium oxide film; Optical properties of CVD Cr2O3 films; Electrochromic properties of chromium oxide thin films; Conclusions; List of Abbreviations; Index.
Erscheint lt. Verlag | 19.2.2007 |
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Zusatzinfo | Illustrations |
Verlagsort | New York |
Sprache | englisch |
Maße | 260 x 180 mm |
Gewicht | 836 g |
Themenwelt | Technik ► Elektrotechnik / Energietechnik |
ISBN-10 | 1-60021-643-9 / 1600216439 |
ISBN-13 | 978-1-60021-643-5 / 9781600216435 |
Zustand | Neuware |
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