Plasma Electronics - Toshiaki Makabe, Zoran Lj. Petrovic

Plasma Electronics

Applications in Microelectronic Device Fabrication
Buch | Hardcover
360 Seiten
2006
Taylor & Francis Ltd (Verlag)
978-0-7503-0976-9 (ISBN)
169,55 inkl. MwSt
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Beginning with an overview of the basic characteristics and applications of low-temperature plasma, this work explores the physics underlying the complex behavior of plasma. It discusses charged particle transport and offers an introduction to macroscopic plasma characteristics and elementary processes in gas phase and on surfaces.
Without plasma processing techniques, recent advances in microelectronics fabrication would not have been possible. But beyond simply enabling new capabilities, plasma-based techniques hold the potential to enhance and improve many processes and applications. They are viable over a wide range of size and time scales, and can be used for deposition, etching, and even process monitoring and diagnosis. Plasma Electronics: Applications in Microelectronic Device Fabrication explains the fundamental physics and numerical methods necessary to bring these technologies from the laboratory to the factory. Beginning with an overview of the basic characteristics and applications of low-temperature plasma, preeminent experts Makabe and Petrovic explore the physics underlying the complex behavior of non-equilibrium (or low temperature) plasma. They discuss charged particle transport in general and in detail as well as macroscopic plasma characteristics and elementary processes in gas phase and on surfaces. After laying this groundwork, the book examines state-of-the-art computational methods for modeling plasma and reviews various important applications including inductively and capacitively coupled plasma, magnetically enhanced plasma, and various processing techniques, while numerous problems and worked examples reinforce the concepts.

Uniquely combining physics, numerical methods, and practical applications, Plasma Electronics: Applications in Microelectronic Device Fabrication equips you with the knowledge necessary to scale up lab bench breakthroughs into industrial innovations.

Introduction
Plasma and Its Classification
Application of Low-Temperature Plasma
Academic Fusion
References
Phenomenological Description of the Charged Particle Transport
Transport in Real (Configuration) Space
Transport in Velocity Space
Thermal Equilibrium and Its Governing Relations
References
Macroscopic Plasma Characteristics
Introduction
Quasi-Neutrality
Charge-Separation in Plasmas
Plasma Shielding
Particle Diffusion
Bohm Sheath Criterion
References
Elementary Processes in Gas Phase and on Surfaces
Particles and Waves
Collisions and Cross Sections
Classical Collision Theory
Quantum Theory of Scattering
Collisions between Electrons and Neutral Atoms/Molecules
Electron–Atom Collisions
Electron–Molecule Collisions
Nonconservative Collisions of Electrons with Atoms and Molecules
Heavy Particle Collisions
Photons in Ionized Gases
Elementary Processes at Surfaces
References
The Boltzmann Equation and Transport Equations of Charged Particles
Introduction
The Boltzmann Equation
Transport Coefficients
The Transport Equation
Collision Term in the Boltzmann Equation
Boltzmann Equation for Electrons
References
General Properties of Charged Particle Transport in Gases
Introduction
Electron Transport in DC-Electric Fields
Electron Transport in RF Electric Fields
Ion Transport in DC-Electric Fields
References
Modeling of Nonequilibrium (Low-Temperature) Plasmas
Introduction
Continuum Models
Particle Models
Hybrid Models
Circuit Model
Electromagnetic Fields and Maxwell’s Equations
References
Numerical Procedure of Modeling
Time Constant of the System
Numerical Techniques to Solve the Time-Dependent Drift-Diffusion Equation
Boundary Conditions
References
Capacitively Coupled Plasma
Radio-Frequency Capacitive Coupling
Mechanism of Plasma Maintenance
References
Inductively Coupled Plasma
Radio-Frequency Inductive Coupling
Mechanism of Plasma Maintenance
Wave Propagation in Plasmas
References
Magnetically Enhanced Plasma
Direct-Current Magnetron Plasma
Unbalanced Magnetron Plasma
RF Magnetron Plasma
Magnetic Confinements of Plasmas
Magnetically Resonant Plasmas
References
Plasma Processing and Related Topics
Introduction
Physical Sputtering
Plasma Chemical Vapor Deposition
Plasma Etching
References
Index

Erscheint lt. Verlag 27.3.2006
Zusatzinfo 807 equations; 33 Tables, black and white; 157 Illustrations, black and white
Verlagsort London
Sprache englisch
Maße 156 x 235 mm
Gewicht 635 g
Themenwelt Technik Maschinenbau
ISBN-10 0-7503-0976-8 / 0750309768
ISBN-13 978-0-7503-0976-9 / 9780750309769
Zustand Neuware
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