Single Chamber Processing

Implementation of gate stack integrated process through a cluster tool concept, A. Kermani et al; integrated processing tools for electronic materials, A.K. Sinha; single wafer integrated processes by RT-LPMOCVD modules - application in the manufacturing of InP-based laser devices, A. Katz and S.J. Pearton; thin dielectric films integrated manufacturing on III-V materials - plasma cleaning and light-assisted chemical vapour deposition, O. Dulac and Y.I. Nissim; in-process control of silicide formation during rapid thermal processing, J.M. Dilhac et al; poly-emitter fabrication in a single vertical reactor clustered with HF vapour etching, M. Hendriks et al; low temperature in-situ cleaning of silicon wafers with an ultra high vacuum compatible plasma source, J. Ramm et al; radial control of the physical properties of RT-LPCVD polysilicon films deposited in a cylindrical cold wall reactor, B. Semmache et al; in-situ process integration of polysilicon emitter stacks by rapid thermal multi-processing, I. Barsoni et al; in-situ ellipsometry for real-time feedback control of oxidation furnaces, C. Schneider et al; critical issues for single-chamber manufacturing - the role of laser technology, D.J. Ehrlich; fabrication and characterization of selectively grown Si1-xGex/Sip+/N heterojunctions using pulsed laser induced epitaxy and gas immersion laser doping, K.J. Kramer et al; a novel VUV photochemical deposition apparatus, C. Manfredotti et al.