Pulsed Laser Deposition of Thin Films
John Wiley & Sons Inc (Verlag)
978-0-471-59218-1 (ISBN)
- Titel erscheint in neuer Auflage
- Artikel merken
This overview describes how to begin research in this newly developing technology, allowing the reader to understand the basics of the process. Internationally recognized experts in their fields cover such fundamentals as history, theory, film characteristics, surface modification, laser technology, materials and applications. The text also includes reviews regarding the entire area of semiconductor buffer layers, thin-film ferroelectrics and ferrites, along with the work involving films deposited by PLD.
Partial table of contents: History and Fundamentals of Pulsed Laser Deposition (J. Cheung). Diagnostics and Characteristics of Laser--Produced Plasmas (D. Geohegan). Particulates Generated by Pulsed Laser Ablation (L.--C. Chen). Angular Distribution of Ablated Material (K. Saenger). Film Nucleation and Film Growth in Pulsed Laser Deposition of Ceramics (J. Horwitz & J. Sprague). Processes Characteristics and Film Properties in Pulsed Laser Plasma Deposition (S. Metev). Commercial Scale--Up of Pulsed Laser Deposition (J. Greer). Pulsed Laser Deposition: Future Trends (T. Venkatesan). Comparison of Vacuum Deposition Techniques (G. Hubler). Pulsed Laser Deposition of High--Temperature Superconducting Thin Films for Active and Passive Device Applications (R. Muenchausen & X. Wu). Pulsed Laser Deposition of Metals (J. Kools). Appendix. References. Index.
| Erscheint lt. Verlag | 28.6.1994 |
|---|---|
| Zusatzinfo | Illustrations |
| Verlagsort | New York |
| Sprache | englisch |
| Maße | 166 x 245 mm |
| Gewicht | 1054 g |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik |
| Naturwissenschaften ► Physik / Astronomie ► Optik | |
| Technik ► Maschinenbau | |
| ISBN-10 | 0-471-59218-8 / 0471592188 |
| ISBN-13 | 978-0-471-59218-1 / 9780471592181 |
| Zustand | Neuware |
| Haben Sie eine Frage zum Produkt? |
aus dem Bereich
