Integrated Circuit Fabrication
Cambridge University Press (Verlag)
978-1-009-30358-3 (ISBN)
Master fundamental technologies for modern semiconductor integrated circuits with this definitive textbook. It includes an early introduction of a state-of-the-art CMOS process flow, exposes students to big-picture thinking from the outset, and encourages a practical integration mindset. Extensive use of process and TCAD simulation, using industry tools such as Silvaco Athena and Victory Process, provides students with deeper insight into physical principles, and prepares them for applying these tools in a real-world setting. Accessible framing assumes only a basic background in chemistry, physics and mathematics, providing a gentle introduction for students from a wide range of backgrounds; and over 450 figures (many in color), and more than 280 end-of-chapter problems, will support and cement student understanding. Accompanied by lecture slides and solutions for instructors, this is the ideal introduction to semiconductor technology for senior undergraduate and graduate students in electrical engineering, materials science and physics, and for semiconductor engineering professionals seeking an authoritative introductory reference.
James D. Plummer is a Professor of Electrical Engineering at Stanford University. He has over thirty years of experience in teaching semiconductor fabrication and device physics, and has served on the Board of Directors of companies including Intel and Cadence. He is a Member of the National Academy of Engineering and the American Academy of Arts and Sciences, a Fellow of the Institute of Electrical and Electronics Engineers, and a co-author of Silicon VLSI Technology (2000). Peter B. Griffin is a Senior Research Engineer in Electrical Engineering at Stanford University, and a recognized expert on microfabrication. He has significant hands-on experience in building semiconductor structures, and teaching semiconductor technology courses, at the Stanford Nanofabrication Facility. He is a co-author of Silicon VLSI Technology (2000).
1. Historical Perspective, Moore's Law and Future Technology Prospects; 2. Modern CMOS Technology; 3. Semiconductor Materials = Crystal Growth, Wafer Preparation and Material Properties; 4. Semiconductor Manufacturing – Clean Rooms, Wafer Cleaning, Gettering and Chip Yield; 5. Lithography; 6. Semiconductor/Insulator Interfaces; 7. Doping in Semiconductors; 8. Ion Implantation; 9. Etching Technologies and Chemical-Mechanical Polishing; 10. Deposition Technologies; 11. Backend (Interconnect) Processing Technologies.
| Erscheinungsdatum | 17.11.2023 |
|---|---|
| Zusatzinfo | Worked examples or Exercises |
| Verlagsort | Cambridge |
| Sprache | englisch |
| Maße | 207 x 261 mm |
| Gewicht | 1770 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| Technik ► Maschinenbau | |
| ISBN-10 | 1-009-30358-9 / 1009303589 |
| ISBN-13 | 978-1-009-30358-3 / 9781009303583 |
| Zustand | Neuware |
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