Materials Processing by Cluster Ion Beams
CRC Press (Verlag)
978-0-367-87229-8 (ISBN)
Materials Processing by Cluster Ion Beams: History, Technology, and Applications discusses the contemporary physics, materials science, surface engineering issues, and nanotechnology capabilities of cluster beam processing.
Written by the originator of the gas cluster ion beam (GCIB) concept, this book:
Offers an overview of ion beam technologies, from the discovery of monomer ions to the introduction of GCIBs
Explores the development of sources for producing cluster beams from solid materials
Describes the engineering characteristics of gas cluster ion beam equipment
Covers cluster ion-solid surface interaction kinetics as well as sputtering, implantation, and ion-assisted deposition
Details surface processing techniques for smoothing, shallow implantation, and preparation of high-quality thin films
Introduces representative examples of emerging GCIB industrial applications
Materials Processing by Cluster Ion Beams: History, Technology, and Applications provides a deeper understanding of the importance of cluster ion beams and their applications.
Isao Yamada was the originator of the concept for the processing of materials by gas cluster ion beams. He is presently a visiting professor at the Graduate School of Engineering of the University of Hyogo in Japan. He is professor emeritus at Kyoto University, where he was director of the Ion Beam Engineering Experimental Laboratory. He received his Ph.D in electrical engineering from Kyoto University and has held visiting scientist appointments at the FOM Institute in Amsterdam, the Massachusetts Institute of Technology, Cornell University, and Northwestern University. For the past 40 years, his principal areas of research have ranged from fundamental physics to practical applications of materials processing by ion beams, with particular emphasis on very low-energy ion-solid interactions.
Ion Beam Technology: Overview and History. History and Milestones of Cluster Beam Development. Development of Cluster Beam Sources for Solid Materials. Gas Cluster Ion Beam Equipment. Cluster Ion-Solid Surface Interaction Kinetics. Cluster Ion Beam Sputtering. Cluster Ion Implantation. Cluster Ion Beam-Assisted Deposition. Applications. Conclusions.
| Erscheinungsdatum | 23.12.2019 |
|---|---|
| Verlagsort | London |
| Sprache | englisch |
| Maße | 156 x 234 mm |
| Gewicht | 453 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| Technik ► Maschinenbau | |
| Technik ► Umwelttechnik / Biotechnologie | |
| ISBN-10 | 0-367-87229-3 / 0367872293 |
| ISBN-13 | 978-0-367-87229-8 / 9780367872298 |
| Zustand | Neuware |
| Haben Sie eine Frage zum Produkt? |
aus dem Bereich
