High Resolution X-Ray Diffractometry And Topography - D.K. Bowen, Brian K. Tanner

High Resolution X-Ray Diffractometry And Topography

Buch | Softcover
264 Seiten
2019
CRC Press (Verlag)
978-0-367-40063-7 (ISBN)
77,30 inkl. MwSt
The study and application of electronic materials has created an increasing demand for sophisticated and reliable techniques for examining and characterizing these materials. This comprehensive book looks at the area of x-ray diffraction and the modern techniques available for deployment in research, development, and production. It provides the theoretical and practical background for applying these techniques in scientific and industrial materials characterization. The main aim of the book is to map the theoretical and practical background necessary to the study of single crystal materials by means of high-resolution x-ray diffraction and topography. It combines mathematical formalisms with graphical explanations and hands-on practical advice for interpreting data.

Bowen, D.K.; Tanner, Brian K.

Introduction- diffraction studies of crystal perfection; high resolution X- ray diffraction techniques; analysis of expitaxial layers; X-ray scattering theory; simulation of X-ray diffraction rocking curves; analysis of thin films and multiple layers; triple axis X-ray diffractometry; single crystal X-ray topography; double crystal X-ray topography; synchrotron radiation topography.

Erscheinungsdatum
Verlagsort London
Sprache englisch
Maße 174 x 246 mm
Gewicht 485 g
Themenwelt Naturwissenschaften Physik / Astronomie Optik
Technik Maschinenbau
Technik Umwelttechnik / Biotechnologie
ISBN-10 0-367-40063-4 / 0367400634
ISBN-13 978-0-367-40063-7 / 9780367400637
Zustand Neuware
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