Diffusion Controlled Growth and Oxidation of Metal-Silicides
Seiten
2019
Trans Tech Publications Ltd (Verlag)
978-3-0357-1505-7 (ISBN)
Trans Tech Publications Ltd (Verlag)
978-3-0357-1505-7 (ISBN)
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Special topic volume with invited peer reviewed papers only
Silicide intermetallics are widely used in various applications such as microelectronics, structural and coating industries. Some aspects of the diffusion-controlled growth and oxidation of metal-silicides are presented in this volume of the journal.
Silicide intermetallics are widely used in various applications such as microelectronics, structural and coating industries. Some aspects of the diffusion-controlled growth and oxidation of metal-silicides are presented in this volume of the journal.
Preface
Mechanisms of Silicide Formation by Reactive Diffusion in Thin Films
Diffusion Rates of Components in Metal-Silicides Depending on Atomic Number of Refractory Metal Component
Diffusion-Limited Reactions of Non-Oxide Ceramics with Transition Metals
Oxidation Behavior of Silicides
Periodic Layer Formation during Multiphase Diffusion in Silicide Systems
| Erscheinungsdatum | 02.05.2019 |
|---|---|
| Reihe/Serie | Diffusion Foundations |
| Zusatzinfo | Illustrations, unspecified |
| Verlagsort | Zurich |
| Sprache | englisch |
| Maße | 170 x 240 mm |
| Gewicht | 480 g |
| Themenwelt | Technik ► Elektrotechnik / Energietechnik |
| Technik ► Maschinenbau | |
| ISBN-10 | 3-0357-1505-X / 303571505X |
| ISBN-13 | 978-3-0357-1505-7 / 9783035715057 |
| Zustand | Neuware |
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