Epitaxial Growth of III-Nitride Compounds -

Epitaxial Growth of III-Nitride Compounds

Computational Approach
Buch | Softcover
IX, 223 Seiten
2019 | 1. Softcover reprint of the original 1st ed. 2018
Springer International Publishing (Verlag)
978-3-030-09542-0 (ISBN)
53,49 inkl. MwSt
This book presents extensive information on the mechanisms of epitaxial growth in III-nitride compounds, drawing on a state-of-the-art computational approach that combines ab initio calculations, empirical interatomic potentials, and Monte Carlo simulations to do so. It discusses important theoretical aspects of surface structures and elemental growth processes during the epitaxial growth of III-nitride compounds. In addition, it discusses advanced fundamental structural and electronic properties, surface structures, fundamental growth processes and novel behavior of thin films in III-nitride semiconductors. As such, it will appeal to all researchers, engineers and graduate students seeking detailed information on crystal growth and its application to III-nitride compounds.

Takashi Matsuoka received his PhD degree in Engineering from Hokkaido University, Sapporo, Japan and has been a Professor at the Institute for Materials Research at Tohoku University, Sendai, Japan since 2005. Having worked at the NTT from 1978 to 2005, he developed a single-longitudinal mode laser diode and proposed the InGaAlN system and the epitaxial growth of a single crystalline InGaN layer for blue LEDs. Yoshihiro Kangawa has been an Associate Professor at the Research Institute for Applied Mechanics (RIAM) of Kyushu University, Fukuoka, Japan since 2005. He received his Doctor of Engineering from Kyushu University and was a research associate at Gakushuin University, Tokyo, Japan from 2000 to 2002. He subsequently served as a research associate at the Department of Applied Chemistry at Tokyo University of Agriculture and Technology from 2002 to 2004. His research is concerned with theoretical investigation of the crystal growth mechanism, e.g. using ab initio-based approaches and thermodynamic analysis.

Introduction.- Computational Methods.- Fundamental Properties of III-Nitrides.- Growth Processes.- Novel Behaviour of Thin Films.- Summary.

Erscheinungsdatum
Reihe/Serie Springer Series in Materials Science
Zusatzinfo IX, 223 p. 136 illus., 101 illus. in color.
Verlagsort Cham
Sprache englisch
Maße 155 x 235 mm
Gewicht 367 g
Themenwelt Technik Elektrotechnik / Energietechnik
Technik Maschinenbau
Schlagworte Adsorption-Desorption Behaviour • Dislocation Core Structure • Empirical Interatomic Potentials • Fundamental Growth Processes • III-Nitride Semiconductors • Monte Carlo simulations • Nonpolar and Semipolar Orientations • Surface Phase Diagram
ISBN-10 3-030-09542-8 / 3030095428
ISBN-13 978-3-030-09542-0 / 9783030095420
Zustand Neuware
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