Ion Implantation for Microelectronics and Optics

Part 1 Ion implementation in solids: ion-matter interaction; range and in-depth distribution in solids; damage; annealing, damage, recovery, impurity activation. Part 2 Techniques for implantation and analysis: implantation accelerators; analysis techniques for implanted materials. Part 3 Ion beam modification of material properties: electrical properites of implanted semiconductors; optical properties modification of implanted semiconductors; ion implantation outside the semiconductor field; chemical modification of implanted materials; implanted devices for microelectronics and optics.