Lithography for VLSI (eBook)

Front Cover 1
Lithography for VLSI 4
Copyright Page 5
Table of Contents 6
List of Contributors 10
Preface 12
Chapter 1. Optical Lithography 14
I. INTRODUCTION 14
II. OPTICAL RESISTS 14
III. CONTACT AND PROXIMITY PRINTING 16
IV. PROJECTION PRINTING 20
REFERENCES 30
Chapter 2. Lumped Parameter Model for Optical Lithography 32
I. INTRODUCTION 33
II. BACKGROUND 34
III. LUMPED PARAMETER MODEL 40
IV. COMPARISON WITH EXPERIMENTAL DATA 51
V. SUMMARY 54
APPENDIX A: IMAGE INTENSITY DISTRIBUTION 55
APPENDIX B: THEORY AND MATHEMATICS OF THE LUMPED PARAMETER MODEL 64
REFERENCES 68
Chapter 3. The Evolution of Electron-Beam Pattern Generators for Integrated Circuit Masks at AT& T Bell Laboratories
1. INTRODUCTION 70
II. INTEGRATED CIRCUIT MASKS 71
III. A NEW SYSTEM: EBES4 78
IV. OVERALL SYSTEM DESCRIPTION 84
V. CONCLUSIONS 114
REFERENCES 115
Chapter 4. Electron Resist Process Modeling 116
I. INTRODUCTION 116
II. ELECTRON-BEAM EXPOSURE MODELING 118
III. ELECTRON RESIST DEVELOPMENT MODELING 129
IV. ELECTRON RESIST PROFILE MODELING 135
V. CONCLUSIONS 155
ACKNOWLEDGMENTS 157
REFERENCES 157
Chapter 5. Ion-Beam Lithography 160
I. INTRODUCTION 161
II. PROCESSING WITH ION BEAMS 162
III. ION-SUBSTRATE INTERACTIONS 164
IV. ION-BEAM LITHOGRAPHY SYSTEMS AND INSTRUMENTATION 186
V. PROBLEMS AND LIMITATIONS IN ION-BEAM LITHOGRAPHY 222
VI. CONCLUSIONS 233
REFERENCES 235
Chapter 6. Alignment Techniques in Optical and X-Ray Lithography 242
1. INTRODUCTION 242
II. REVIEW OF OPTICAL PRINCIPLES 243
III. METHODS OF ALIGNMENT 250
IV. MEASUREMENT OF ALIGNED WAFERS 274
V. SUMMARY 276
REFERENCES 277
Chapter 7. Metrology in Microlithography 278
I. INTRODUCTION 279
II. ACCURACY AND PRECISION 280
III. IMAGING IN THE OPTICAL MICROSCOPE 286
IV. IMAGING IN THE SCANNING ELECTRON MICROSCOPE 309
V. DIMENSIONAL METROLOGY 318
VI. CONCLUSIONS 328
ACKNOWLEDGMENTS 329
REFERENCES 329
Chapter 8. Electrical Measurements for Characterizing Lithography 332
I. INTRODUCTION 333
II. LITHOGRAPHIC SYSTEMS 334
III. ELECTRICAL MEASUREMENT 344
IV. IMAGERY CHARACTERIZATION 354
V. OVERLAY CHARACTERIZATION 358
VII. CONCLUSION 367
APPENDIX A 368
ACKNOWLEDGMENT 369
REFERENCES 369
Index 370