Nanoimprint Lithography: An Enabling Process for Nanofabrication

(Autor)

Buch | Hardcover
XIII, 249 Seiten
2013 | 2013
Springer Berlin (Verlag)
978-3-642-34427-5 (ISBN)

Lese- und Medienproben

Nanoimprint Lithography: An Enabling Process for Nanofabrication - Weimin Zhou
160,49 inkl. MwSt
With hundreds of explanatory figures and tables, this volume deals with the latest achievements in hot areas such as nanofabrication and nanotechnology, with multi-disciplinary results on promising low-cost, high-throughput nanostructure manufacturing methods.
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It provides the exciting, multidisciplinary field, offering a wide range of topics covering: principles, process, material and application.
This book would be of specific interest for researchers and graduate students in the field of nanoscience, nanotechnology and nanofabrication, material, physical, chemical, electric engineering and biology.
Dr. Weimin Zhou is an associate professor at Shanghai Nanotechnology Promotion Center, China.

Weimin Zhou Received a Ph.D. degree in Microelectronics and Solid-State Electronics from Shanghai Jiao Tong University, China. He is currently a Professor of Nanomaterials and Nanoelectronics in Shanghai Nanotechnology Promotion Center. His research interests cover semiconductor nanomaterials (nanowires, carbon-based, phase change material), novel semiconductor or nano devices, and nanofabrication, and lithium ion battery, etc. He has authored or coauthored more than 30 papers in scientific journals and is the holder of four patents in the micro/nano electronics area and material Engineering. Some research achievement is highlighted by Nature Nanotechnlogy magazine. He is also a reviewer for many scientific magazines, such as Appl. Phys. Lett, Nanotechnolgoy.

Principles and statues of nanoimprint lithography.- Stamp Fabrication.- stamp surface treatment.- Nanoimprint lithography resists.- Nanoimprint lithography process.- Modeling and Simulation of NIL.- Application of NIL in Light emitting Diodes.- Application of NIL in memory devices.- Application of NIL in solar cell.

Erscheint lt. Verlag 4.1.2013
Zusatzinfo XIII, 249 p.
Verlagsort Berlin
Sprache englisch
Maße 155 x 235 mm
Gewicht 530 g
Themenwelt Technik Elektrotechnik / Energietechnik
Schlagworte Light emitting diodes • Memory devices • Nanoimprint Lithography • Nanotechnologie • Solar cell
ISBN-10 3-642-34427-5 / 3642344275
ISBN-13 978-3-642-34427-5 / 9783642344275
Zustand Neuware
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