X-ray Scattering From Semiconductors - Paul F Fewster

X-ray Scattering From Semiconductors

(Autor)

Buch | Hardcover
304 Seiten
2000
Imperial College Press (Verlag)
978-1-86094-159-7 (ISBN)
118,45 inkl. MwSt
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A study of X-ray scattering from semiconductors. It covers X-ray diffractometers and their instrument functions, data collection methods, and the simulation of the diffraction patterns observed. It also presents examples and procedures for interpreting the data to build a picture of the sample.
X-ray scattering is used extensively to provide detailed structural information about materials. Semiconductors have benefited from X-ray scattering techniques as an essential feedback method for crystal growth, including compositional and thickness determination of thin layers. The methods have been developed to reveal very detailed structural information concerning material quality, interface structure, relaxation, defects, surface damage, etc.This book provides a thorough description of the techniques involved in obtaining that information, including X-ray diffractometers and their associated instrument functions, data collection methods, and the simulation of the diffraction patterns observed. Also presented are examples and procedures for interpreting the data to build a picture of the sample, much of which will be common to materials other than semiconductors.

An introduction to semiconductor materials; an introduction to X-ray scattering; equipment for measuring diffraction patterns; a practical guide to the evaluation of structural parameters.

Verlagsort London
Sprache englisch
Themenwelt Naturwissenschaften Physik / Astronomie Festkörperphysik
Technik Maschinenbau
ISBN-10 1-86094-159-1 / 1860941591
ISBN-13 978-1-86094-159-7 / 9781860941597
Zustand Neuware
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