Introduction to Plasma Physics and Controlled Fusion
Springer-Verlag New York Inc.
978-1-4419-3201-3 (ISBN)
Prof. Chen is a plasma physicist with a career extending over 48 years and encompassing both experiment and theory. He has devoted about a decade each to the subfields of magnetic fusion, laser fusion, plasma diagnostics, basic plasma physics, and low-temperature plasma physics. Most plasma students are familiar with his textbook Introduction to Plasma Physics and Controlled Fusion. His current interest is in plasma processing of semiconductor circuits, especially the radiofrequency sources used to make computer chips, and in the physical processes that permit etching millions of transistors on a single chip. To learn more about this, please visit the site for UCLA's Low Temperature Plasma Technology Laboratory (LTPTL): http://www.ee.ucla.edu/~ltptl/. Though formally retired from teaching, Prof. Chen still maintains an active research group with graduate students and postdocs.
1. Introduction.- 2. Single-Particle Motions.- 3. Plasmas as Fluids.- 4. Waves in Plasmas.- 5. Diffusion and Resistivity.- 6. Equilibrium and Stability.- 7. Kinetic Theory.- 8. Nonlinear Effects.- Appendices.- Appendix A. Units, Constants and Formulas, Vector Relations.- Appendix B. Theory of Waves in a Cold Uniform Plasma.- Appendix C. Sample Three-Hour Final Exam.- Appendix D. Answers to Some Problems.- Index to Problems.
Erscheint lt. Verlag | 1.12.2010 |
---|---|
Zusatzinfo | XVII, 421 p. |
Verlagsort | New York, NY |
Sprache | englisch |
Maße | 155 x 235 mm |
Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Angewandte Physik |
Naturwissenschaften ► Physik / Astronomie ► Atom- / Kern- / Molekularphysik | |
Naturwissenschaften ► Physik / Astronomie ► Optik | |
Naturwissenschaften ► Physik / Astronomie ► Plasmaphysik | |
Technik ► Luft- / Raumfahrttechnik | |
ISBN-10 | 1-4419-3201-1 / 1441932011 |
ISBN-13 | 978-1-4419-3201-3 / 9781441932013 |
Zustand | Neuware |
Haben Sie eine Frage zum Produkt? |
aus dem Bereich