Lock-in Thermography - Otwin Breitenstein, Wilhelm Warta, Martin Langenkamp

Lock-in Thermography

Basics and Use for Evaluating Electronic Devices and Materials
Buch | Softcover
VIII, 193 Seiten
2011 | 1., st Edition. Softcover version of original hardcover edition 2003
Springer Berlin (Verlag)
978-3-642-07785-2 (ISBN)
128,35 inkl. MwSt
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This is the first book on lock-in thermography, an analytical method applied to the diagnosis of microelectronic devices. This useful introduction and guide reviews various experimental approaches to lock-in thermography, with special emphasis on the lock-in IR thermography developed by the authors themselves.

Otwin Breitenstein studied physics at Leipzig university and graduated there in 1980. After dealing with spatially resolved capacitance spectroscopy of point defects (Scanning-DLTS) at the Institute of Solid State Physics and Electron Microscopy in Halle until 1992, he is a scientific staff member at Max Planck Institute of Microstructure Physics, Halle. His main interest field is electronic device and materials analysis by electron microscopic and IR-based methods. Wilhelm Warta studied Physics at Würzburg and then Stuttgart University, where he graduated and received his PhD with research on charge transport properties of organic molecular crystals. 1985 he joined Fraunhofer Institute for Solar Energy Systems in Freiburg starting with work on carrier lifetime measurement techniques for semiconductor materials. His fields are the development of measurement techniques for solar cell development, characterization of solar cell material and solar cells, device and process simulation as well as high precision calibration of solar cells.

Introduction.- Physical and Technical Basics.- Experimental Technique.- Theory.- Measurement Strategies.- Typical Applications.- Summary and Outlook.- References.- Appendices.- Index.

Reihe/Serie Springer Series in Advanced Microelectronics
Sprache englisch
Maße 155 x 235 mm
Einbandart Paperback
Themenwelt Technik Elektrotechnik / Energietechnik
Schlagworte Failure analysis • Lifetime mapping • Shunt imaging • Solar cell characterization • Trap density mapping
ISBN-10 3-642-07785-4 / 3642077854
ISBN-13 978-3-642-07785-2 / 9783642077852
Zustand Neuware
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