Fabrication of Bragg Gratings Using Interferometric Lithography
A guide to design a robust setup to fabricate Bragg Gratings at the telecommunication frequency
Seiten
2009
VDM Verlag Dr. Müller
978-3-639-21030-9 (ISBN)
VDM Verlag Dr. Müller
978-3-639-21030-9 (ISBN)
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A setup has been designed and realized for the fabrication of Bragg Gratings in edge emitting semiconductor laser. In this setup a HeCd laser ( =325nm) is used in a Lloyd s mirror configuration, to interferometrically expose a sinusoidal grating on photoresist. The dilution of photo-resistant (PR) material allows for a spincoat thickness of 50nm which is needed to minimize standing waves in the photo-resist that lead to a nonuniform exposure. Variations of exposure time show the progression of photo-resist gratings. Etching recipes using both dry and wet etching techniques were successfully used to transfer the grating pattern into semiconductor material. Bragg Gratings with =250nm in InP and InGaAs have been characterized with an Atomic Force Microscope to have a grating height of over 100nm.
My immediate family is entirely from Chile, I was born in Brasil but have been living in the US for the past 16 years. I owe all my achievements to my family's endless love and support. My studies were in Electrical Engineering but my passion now lies in Biomedical Research where I am able to see the effect engineering has in helping others.
Sprache | englisch |
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Themenwelt | Technik ► Elektrotechnik / Energietechnik |
ISBN-10 | 3-639-21030-1 / 3639210301 |
ISBN-13 | 978-3-639-21030-9 / 9783639210309 |
Zustand | Neuware |
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Buch | Hardcover (2023)
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49,99 €