Lithography Process Control
Seiten
1999
SPIE Press (Verlag)
978-0-8194-3052-6 (ISBN)
SPIE Press (Verlag)
978-0-8194-3052-6 (ISBN)
This text is intended to be a self-contained tutorial on lithography process control. It works as an introduction to those entering the field, and as a reference for the experienced lithography engineer. Topics covered include linewidth control, overlay, and yield.
This tutorial text covers lithography process control at several levels, from fundamental through advanced topics. A basic familiarity with lithography science is assumed. The book is intended to be a self contained tutorial that works as an introduction to those entering the field, and as a reference for the experienced lithography engineer.
This tutorial text covers lithography process control at several levels, from fundamental through advanced topics. A basic familiarity with lithography science is assumed. The book is intended to be a self contained tutorial that works as an introduction to those entering the field, and as a reference for the experienced lithography engineer.
Introduction to the use of statistical process control in lithography; sampling; simple and complex processes; linewidth control; overlay; yield; process drift and automatic process control; metrology; control of operations.
Erscheint lt. Verlag | 31.5.1999 |
---|---|
Reihe/Serie | Tutorial Texts |
Zusatzinfo | Illustrations, 1 port. |
Verlagsort | Bellingham |
Sprache | englisch |
Gewicht | 444 g |
Themenwelt | Kunst / Musik / Theater ► Fotokunst |
Sachbuch/Ratgeber ► Freizeit / Hobby ► Fotografieren / Filmen | |
Technik | |
ISBN-10 | 0-8194-3052-8 / 0819430528 |
ISBN-13 | 978-0-8194-3052-6 / 9780819430526 |
Zustand | Neuware |
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