Plasma Spectroscopy

The Influence of Microwave and Laser Fields

Eugene Oks (Autor)

XIII, 182 Seiten
1995
Springer Berlin (Hersteller)
978-3-540-54100-4 (ISBN)

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This monograph develops the foundations of spectroscopy for plasmas subjected to quasi-monochromatic electric fields in the microwave or visible range. It describes methods for measuring the fields, and discusses their practical applications.

This study develops the foundations of spectroscopy for plasmas subjected to quasi-monochromatic electric fields in the microwave or visible range. Such fields may be due to longitudinal Langmuir waves or low hybrid oscillations, which are excited in pulsed discharges or by high-current beams of charged particles. Even more important are the transverse fields present in the plasmas of tokamaks, laser fusion and technological microwave discharges. The text is intended for researchers dealing with plasma spectroscopy, plasma diagnostics, high frequency and microwave discharges, laser induced discharges, particle and laser-beam interactions with plasmas, controlled fusion, and ionospheric and astrophysical plasmas. It describes methods for measuring the field and plasma parameters and discusses their practical application. It also presents new results on nonpertubative analysis of the interaction of quantum systems with a strong radiation field.
Reihe/Serie Springer Series on Atoms and Plasmas ; Vol.9
Zusatzinfo 74 figs., 3 tabs.
Sprache englisch
Gewicht 426 g
Einbandart gebunden
Schlagworte Plasma • Spektroskopie • Springer Series on Atoms and Plasmas; Vol 9
ISBN-10 3-540-54100-4 / 3540541004
ISBN-13 978-3-540-54100-4 / 9783540541004
Zustand Neuware
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