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Semiconductor Materials and Devices
Narosa Publishing House (Verlag)
978-81-7319-187-9 (ISBN)
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This volume has been divided into four parts. Part 1 deals with material for optoelectronics, part 2 covers semiconductor processing and characterization, part 3 describes IR devices and systems while part 4 describes other devices. The volume is an overview of recent advances in semiconductor-based optoelectronic devices, and systems both for civil and defence applications. Evolution of photocathodes for image intensifiers and advancement in IR detector technology leading to development of compact high performance thermal imagers is also described. Special features of semiconductor lasers and applications including fibre optic communication and rotation sensor is brought out. The role of semiconductors in photonics, namely photorefractive spatial high modulators, optical phase conjugation, and integrated optics, is also briefly been covered.
Part 1 Material for Optoelectronics: Quantum Confinement in Porous Silicon, V.K. Jain et al; Conduction Model for Polycrystalline Silicon Films, S.S. Negi and O.P. Joshi; Photo-CVD Silicon Nitride Thin Films - Preparation, Properties and Applications, O.P. Agnihotri and V.K. Rathi; Some Novel Structures by Molecular Beam Epitaxy, G.P. Kothiyal; Nonlinearities in Strained (III)B InxGa1-xAS/A10.2-Ga0.8 as Multiple Quantum Wells, V. Das et al; Fluorine Induced Group V Inter-Diffusion in III-V Quantum Wells, V. Das; Quality Assessment of GaAs/Si Materials Grown with Atomic Layer Epitaxial Predisposition Layers, S. Dhar et al; Effect of Impurity Position on the Binding Energy or Donor in a Quantum Well, V. Anitha et al. Part 2 Semiconductor Processing and Characterization: Anisotropic Wet Chemical Etching of Monocrystalline Silicon, S. Ahmad; A Quasi Two-Dimensional Model for the Analysis and Simulation of Capacitance - Voltage Profiles Observed Experimentally in a Si-Si, Ge-Si Quantum Well, D. Biswas et al; Electrically Active Defects Due to End-of-Ion-Range in Silicon Irradiated with MeV Ar+ Ion, P.K. Giri et al; Study Hydrogen Diffusion in Silicon by Elastic Recoil Detection Analysis, T. Som et al; Time Analyze Transient Spectroscopy Analysis of Photo-Induced Current Transient in Undoped Semi-Insulating Gallium Arsenide, P.K. Giri and Y.N. Mohapatra; New Donor Formation in Cz-Si Heat Treated at 650'C, O. Prakash and S. Singh; Factors Determining Resolution and Repeatability in SRP Measurements, P. Datta et al. Part 3 IR Devices and Systems: Recent Advances in Semiconductor Based Optoelectronic Devices and Systems, O.P. Nijhawan; Focal Plane Array (FPA) For Infrared Imaging Application, A.V.R. Warrier et al; Characterization of Surface and Bulk Effect by Variable Area Diode Test Strucures in Hg Cd Te Technology, V. Gopal; Computer Studies on Nearly 2mm Germanium p-n Junction IMPATT Source for Possible IR Detection, S.P. Pati et al. Part 4 Other Devices: General Expression for Optimum Load, Maximum Power and Fill Factor of Solar Cell Using a Double Exponential Model, A. Kapoor et al; Interface State Energy Distribution from Non-Ideal (I-V) Characteristics of Ni/n-Si Schottky Barrier Diode, P.P. Sahay; A Process and Device Simulation Model for the Fabrication GaAs MESFET, M.B. Dutt et al; Effects of Pearson IV - Distribution on Intrinsic Gate - Drain Capacitance for an Ion Implanted Si MESFET, S. Rajesh and R.S. Gupta; Channelling and Channelling Radiation in Semiconductor Superlattices, A.P. Pathak et al.
Erscheint lt. Verlag | 17.1.2001 |
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Zusatzinfo | Illustrations |
Verlagsort | New Delhi |
Sprache | englisch |
Maße | 155 x 230 mm |
Gewicht | 644 g |
Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Optik |
Technik ► Elektrotechnik / Energietechnik | |
ISBN-10 | 81-7319-187-5 / 8173191875 |
ISBN-13 | 978-81-7319-187-9 / 9788173191879 |
Zustand | Neuware |
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