Microbeam and Nanobeam Analysis -

Microbeam and Nanobeam Analysis

Buch | Softcover
XI, 643 Seiten
1996 | 1. Softcover reprint of the original 1st ed. 1996
Springer Wien (Verlag)
978-3-211-82874-8 (ISBN)
106,99 inkl. MwSt
This supplement of Mikrochimica Acta contains selected papers from the Fourth Workshop of the European Microanalysis Society (EMAS) on "Modern Develop ments and Applications in Microbeam Analysis" which took place in May 1995 in Saint Malo (France). EMAS was founded in 1986 by members from almost all european countries in order to stimulate research, applications and development of all forms of microbeam methods. One important EMAS activity is the organisation of biennial workshops for demonstrating the current status and developing trends of microanalytical techniques. For this meeting, EMAS chose to highlight the following topics: Monte-Carlo simula tions, transport calculations and use of soft X-rays for electron probe microanalysis (EPMA), dynamic secondary ion mass spectrometry (SIMS), detection of small quan tities using different techniques: synchrotron radiation X-ray fluorescence, particle in duced X-ray emission (PIXE), cathodoluminescence microscopy (CL). Two new kinds of instrumental techniques were also presented: atomic probe and scanning probe microscopy (STM). The aim of the conference is to give introductory lectures corresponding to the topics of the meeting and to have contributions in the form of po ster sessions. More than 80 posters were presented. Most of them gave a short oral pre sentation. The poster subjects were related to the use of microanalytical techniques: EPMA with wavelength dispersive spectrometry (WDS) and energy dispersive spec trometry (EDS), Auger electron spectrometry (AES), secondary ion mass spectro metry (SIMS), scanning electron microscopy and other topographical methods like scanning tunneling microscopy (STM) or atomic force microscopy (AFM).

Monte Carlo Simulation Techniques for Quantitative X-Ray Microanalysis.- Transport Equation Approach to Electron Microbeam Analysis: Fundamentals and Applications.- Use of Soft X-Rays in Microanalysis.- Intensity Measurement of Wavelength Dispersive X-Ray Emission Bands: Applications to the Soft X-Ray Region.- Synchrotron Radiation Induced X-ray Microfluorescence Analysis.- Particle-Induced X-Ray Emission - A Quantitative Technique Suitable for Microanalysis.- Cathodoluminescence Microscopy and Spectroscopy of Semiconductors and Wide Bandgap Insulating Materials.- Time-of-Flight Secondary Ion Mass Spectrometry (ToF-SIMS).- Three-Dimensional Nanoanalysis with the Tomographic Atom-Probe.- Microanalysis at Atomic Resolution.- Composition of Vanadium Carbides Formed by Solidification in Fe-V-C-M Alloys: Influence of Additions (M = Al, Cu, Mo).- Electron Transmission Coefficient for Oblique Angle of Incidence.- Depth Distribution Function for Oblique Angle of Incidence.- Simulation of EDS Spectra Using X-RES Software.- On the Use of the GeL? Line in Thin Film X-Ray Microanalysis of Si1-x Gex/Si Heterostructures.- Computer Simulations of the X-Ray Intensity Distribution from Submicron Particles Embedded in a Matrix.- Determination of Rare Earth Elements in Biological and Mineral Apatite by EPMA and LAMP-ICP-MS.- Quantitative Analysis of the Compound Layer of Plasma Nitrided Pure Iron.- Correction of the Edge Effect in Auger Electron Microscopy.- Low Energy Imaging of Nonconductive Surfaces in SEM.- Investigation of the Bonding Mechanism of Glass Ceramic Layers on Metal Alloys.- Monte Carlo Method for Quantitative Analysis of Bulk and Layered Samples.- SIMS Linescan Profiling of Chemically Bevelled Semiconductors: a Method of Overcoming Ion Beam Induced Segregation in DepthProfiling.- Experimental Verification of Theoretical Models Simulating the Temperature Increase in EPMA of Glass.- Quantitation of Mineral Elements of Different Fruit Pollen Grains.- Electron Beam Induced Migration of Alkaline Ions in Silica Glass.- Application of the Boltzmann Transport Equation in the Thickness Determination of Thin Films.- Characterisation of the Shape of Microparticles via Fractal and Fourier Analyses of Scanning Electron Microscope Images.- Calculation of the Surface Ionisation Using Analytical Models of Electron Backscattering.- Thickness Determination of Thin Insulating Layers.- High Energy and Angular Resolution Dynamic Secondary Ion Mass Spectrometry.- EPMA and Mass Spectrometry of Soil and Grass Containing Radioactivity from the Nuclear Accident at Chernobyl.- Application of a New Monte Carlo Simulation Algorithm to Electron Probe Microanalysis.- Topography Development on Single Crystal MgO Under Ion Beam Bombardment.- Determination of SPM TIP Shape Using Polystyrene Latex Balls.- Combined Characterization of Nanostructures by AEM and STM.- Study of Quasi-Fractal Many-Particle-Systems and Percolation Networks by Zero-Loss Spectroscopic Imaging, Electron Energy-Loss Spectroscopy and Digital Image Analysis.- Calculation of Bremsstrahlung Spectra for Multilayer Samples.- Thickness Measurement of Thin Films by EPMA - Influence of ? (0), MAC's and Substrate.- A Simple Procedure to Check the Spectral Response of an EDX Detector.- Virtual WDS.- Monte Carlo Simulation Program with a Free Configuration of Specimen and Detector Geometries.- Barriers to Energy Dispersive Spectrometry with Low Energy X-Rays.- Measurements of Ga1-xAlxAs Layers on GaAs with EDS.- The Relative Intensity Factor for La Radiation Considering the Different Mass Absorptionof La and L? Radiation.- Determination of the Solubility of Cerium in BaTiO3 by Quantitative WDS Electron Probe Microanalysis.- Simulation of X-Ray Diffraction Profiles of Gradually Relaxed Epilayers.- Monte Carlo Simulation of Electron Scattering for Arbitrary 2D Structures Using a Modified Quadtree Geometry Discretization.- Chemical-Bond Characterization of Nanostructures by EELS.- Local Determination of Carbon by Combining Beta-Autoradiography and Electron Microprobe Analysis.- The Check of the Elastic Scattering Model in Monte-Carlo Simulation.- True Colour X-Ray Vision for Electron Microscopy and Microanalysis.- Determination of the Oxidation States of Nb by Auger Electron Spectroscopy.- Study by SIMS of the 54Cr and 18O Diffusion in Cr2 O3 and in Cr2O3 Scales.- Comparison of Back-Foil Scanning X-Ray Microfluorescence and Electron Probe X-Ray Microanalysis for the Elemental Characterisation of Thin Coatings.- Electron Probe X-Ray Microanalysis of Coatings.- Analysis of Layers: X-Ray Maps of Change in Thickness Obtained by Electron Macroprobe.- Comparison of Simulated and Experimental Auger Intensities of Au, Pt, Ni and Siin Absolute Units.- Practical Aspects and Applications of EPMA at Low Electron Energies.- Oxidation and Reduction Processes of Be/BeO Induced by Electrons.

Erscheint lt. Verlag 6.11.1996
Reihe/Serie Mikrochimica Acta Supplementa
Zusatzinfo XI, 643 p. 98 illus., 4 illus. in color.
Verlagsort Vienna
Sprache englisch
Maße 210 x 280 mm
Gewicht 1770 g
Themenwelt Naturwissenschaften Chemie Analytische Chemie
Schlagworte Absorption • diffraction • Electron Microscope • electron microscopy • Elektronenmikroskopie • Glass • HC/Chemie/Anorganische Chemie • HC/Chemie/Theoretische Chemie • Imaging • Microscopy • Mikrosystemtechnik • Nanotechnologie • Oberflächenanalyse • scanning electron microscope • Sekundärionenmassenspektrometrie (SIMS) • semiconductor • spectroscopy • Synchrotron radiation • Transmission
ISBN-10 3-211-82874-5 / 3211828745
ISBN-13 978-3-211-82874-8 / 9783211828748
Zustand Neuware
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