Glow Discharge Processes - Brian Chapman

Glow Discharge Processes

Sputtering and Plasma Etching

(Autor)

Buch | Hardcover
432 Seiten
1980
Wiley-Interscience (Verlag)
978-0-471-07828-9 (ISBN)
281,36 inkl. MwSt
Develops detailed understanding of the deposition and etching of materials by sputtering discharge, and of etching of materials by chemically active discharge. Treats glow discharge at several levels from basic phenomena to industrial applications--practical techniques diligently related to fundamentals. Subjects range from voltage, distributions encountered in plasma etching systems to plasma-electron interactions that contribute to sustaining the discharge.

Brian Chapman is the author of Glow Discharge Processes: Sputtering and Plasma Etching, published by Wiley.

Gases.

Gas Phase Collision Processes.

Plasmas.

DC Glow Discharges.

RF Discharges.

Sputtering.

Plasma Etching.

Appendices.

Index.

Erscheint lt. Verlag 5.11.1980
Sprache englisch
Maße 164 x 241 mm
Gewicht 848 g
Themenwelt Naturwissenschaften Physik / Astronomie Elektrodynamik
ISBN-10 0-471-07828-X / 047107828X
ISBN-13 978-0-471-07828-9 / 9780471078289
Zustand Neuware
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