Handbook of Vacuum Technology
Wiley-VCH (Verlag)
978-3-527-41338-6 (ISBN)
Karl Jousten is head of the section Vacuum Metrology at the Physikalisch-Technische Bundesanstalt (PTB), the German National Institute for Metrology. He obtained his masters and Ph.D. degree in physics from the University of Heidelberg. After working as a post-doc at the Max-Planck-Institute for Nuclear Physics in Heidelberg, at the Oregon Graduate Institute of Science and Technology in the United States, and finally at the Fritz-Haber-Institute in Berlin, he joined the vacuum group at PTB in Berlin in 1990 that he leads since 1992. He has authored many scientific articles in the field as well as contributions to textbooks and edits the German edition of this book, "Wutz Handbuch Vakuumtechnik". He is active in the field of national (DIN) and international (ISO) standardization in vacuum technology. From 2005 to 2008, Karl Jousten has served as President of the German Vacuum Society. Since 2005 he chairs the international working group for low and very low pressures of the respective committee (CCM) of the Meter Convention.
The History of Vacuum Science and Vacuum Technology
Applications and Scope of Vacuum Technology
Gas Laws and Kinetic Theory of Gases
Gas Flow
Analytical and Numerical Calculations of Rarefied Gas Flows
Sorption and Diffusion
Positive Displacement Pumps
Jet and Diffusion Pumps
Molecular and Turbomolecular Pumps
Sorption Pumps
Cryotechnology and Cryopumps
Total Pressure Vacuum Gauges
Partial Pressure Vacuum Gauges and Leak Detectors
Calibrations and Standards
Materials
Vacuum Components, Seals and Joints
Operating Vacuum Systems
Methods of Leak Detection
Appendix
Erscheinungsdatum | 13.07.2016 |
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Verlagsort | Weinheim |
Sprache | englisch |
Maße | 170 x 244 mm |
Gewicht | 2122 g |
Themenwelt | Naturwissenschaften ► Physik / Astronomie |
Technik ► Maschinenbau | |
Schlagworte | chemical engineering • Chemical Engineering Fundamentals • Chemie • Chemische Verfahrenstechnik • Chemistry • Dünne Schichten, Oberflächen u. Grenzflächen • Grundlagen der Chemischen Verfahrenstechnik • Industrial Engineering • Industrial Engineering / Manufacturing • Industrielle Verfahrenstechnik • Maschinenbau • Maschinenbau - Entwurf • Materials Science • Materialwissenschaften • mechanical engineering • Mechanical Engineering - Design • Oberflächen- u. Kolloidchemie • Physics • Physik • Plasma physics • Plasmaphysik • Process Engineering • Produktion i. d. Industriellen Verfahrenstechnik • Prozesssteuerung • Surface & Colloid Chemistry • Thin Films, Surfaces & Interfaces • Vakuum • Vakuumpumpe • Vakuumtechnik |
ISBN-10 | 3-527-41338-3 / 3527413383 |
ISBN-13 | 978-3-527-41338-6 / 9783527413386 |
Zustand | Neuware |
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