Silicides: Fundamentals & Applications -

Silicides: Fundamentals & Applications

Francois d'Heurle, Leo Miglio (Herausgeber)

Buch | Hardcover
388 Seiten
2000
World Scientific Publishing Co Pte Ltd (Verlag)
978-981-02-4452-1 (ISBN)
178,30 inkl. MwSt
The 16th Course of the International School of Solid State Physics, held in 1999, was intended to gather people concerned with the properties and applications of silicides. This collection of proceedings is therefore concerned with theory as well as applications across different disciplines.
Silicides were introduced into the technology of electronic devices some thirty years ago; since then, they have been continuously used to form both ohmic and rectifying contacts to silicon. Silicides are also important for other applications (thermoelectric devices and structural applications, such as jet engines), but it is not easy to find an updated reference containing both their basic properties, either chemical or physical, and the latest applications.The 16th Course of the International School of Solid State Physics, held in Erice (Italy) in the late spring of 1999, was intended to break artificial barriers between disciplines, and to gather people concerned with the properties and applications of silicides, regardless of the formal fields to which they belong, or of the practical goals they pursue. This book is therefore concerned with theory as well as applications, metallurgy as well as physics, and materials science as well as microelectronics.

Crystal chemistry of metal silicides, R. Madar; bonding and polymorphism in transition metal disilicides, L. Miglio et al; diffusion in silicides - basic approach and practical applications, P. Gas and F.M. d'Heurle; silicides and thermodynamics, C. Bernard and A. Pisch; optical properties of silicides - theory and experiment, V. Antonov and F. Marabelli; fundamental electronic properties of semiconducting silicides, V. Borisenko; semiconducting silicides - thermoelectric properties and applications, A. Heinrich; metallic silicides, G. Ottaviani; the kinetics of reactive phase formation - silicides, F.M. d'Heurle; reactive phase formation in binary and tertiary silicide systems, A.A. Kodentsov et al; epitaxial silicides, H. Von Kanel; ion beam synthesis, molecular beam allotaxy and self-assembled patterning of epitaxial silicides, S. Mantl; silicides - materials science and applications for microelectronics, K. Maex and A. Lauwers; the changing views on the Schottky Barrier, R. Tung; metal rich structural silicides, A.J. Thom et al. (Part contents)

Reihe/Serie The Science And Culture Series - Materials Science
Verlagsort Singapore
Sprache englisch
Themenwelt Naturwissenschaften Physik / Astronomie Angewandte Physik
Naturwissenschaften Physik / Astronomie Elektrodynamik
Naturwissenschaften Physik / Astronomie Festkörperphysik
ISBN-10 981-02-4452-5 / 9810244525
ISBN-13 978-981-02-4452-1 / 9789810244521
Zustand Neuware
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