Intermetallic Semiconducting Films (eBook)
372 Seiten
Elsevier Science (Verlag)
978-1-4831-8642-9 (ISBN)
The book discusses the available references on the preparation and identification of the material. An assessment of its device applications and other possible use is also enumerated. The book describes the structures and physical parts of different films. A section of the book covers the three temperature methods of preparing the film. Processes such as vacuum evaporation, flash evaporation, condensation, and coevaporation are explained. Liquid phase epitaxial growth is another method discussed in the book. A chapter of the book explains the electrical and galvanomagnetic properties of films.
The text is intended for students doing experimental investigations on semiconducting films and for research scientists on the field of semiconductors.
Intermetallic Semiconducting Films introduces the physics and technology of A??v compound films. This material is a type of a polycrystalline semiconductor that is used for galvanomagnetic device applications. Such material has a high electron mobility that is ideal for generators and magnetoresistors. The book discusses the available references on the preparation and identification of the material. An assessment of its device applications and other possible use is also enumerated. The book describes the structures and physical parts of different films. A section of the book covers the three temperature methods of preparing the film. Processes such as vacuum evaporation, flash evaporation, condensation, and coevaporation are explained. Liquid phase epitaxial growth is another method discussed in the book. A chapter of the book explains the electrical and galvanomagnetic properties of films. The text is intended for students doing experimental investigations on semiconducting films and for research scientists on the field of semiconductors.
Front Cover 1
Intermetallic Semiconducting Films 4
Copyright Page 5
Table of Contents 8
CHAPTER 1. PREPARATION OF III–V COMPOUND LAYERS 12
1.1 Survey of Techniques 13
1.2 Vacuum Deposition 15
1.3 Chemical Vapor Phase Growth 43
1.4 Liquid Phase Epitaxial Growth 75
1.5 Cathodic Sputtering 77
1.6 Electron Beam Crystallization and Zone Refining 81
1.7 Casting of Thin Films from the Bulk 90
CHAPTER 2. STRUCTURE AND MORPHOLOGY OF FILMS 92
2.1 General Considerations 93
2.2 Morphology and Texture of Evaporated Films 97
2.3 Structure and Composition of Flash-evaporated AIIIBv and Mixed Compound Films 104
2.4 Structure of Dendritic Films 110
2.5 Structure of Homoepitaxial Films 113
2.6 Structure of Heteroepitaxial Films 124
2.7 Texture of Sputtered Films 132
CHAPTER 3. ELECTRICAL AND GALVANOMAGNETIC PROPERTIES 136
3.1 Surface Scattering and Space Charge Effects 137
3.2 Inhomogeneities 144
3.3 Internal Stresses and Structural Defects 148
3.5 Gallium Antimonide and Aluminum Antimonide 178
3.6 Indium Arsenide and Gallium Arsenide 183
3.7 Aluminum Arsenide 192
3.8 Gallium Phosphide and Gallium Arsenide-Phosphide 195
3.9 High-frequency Charge Carrier Transport Phenomena 203
CHAPTER 4. OPTICAL PROPERTIES 226
4.1.1 Optical Absorption 227
4.1.2 Luminescence and Radiative Transitions 228
4.1.3 Optical Parameters 230
4.1.4 Measurement Procedures 233
4.1.5 Photoconductivity 234
4.2.1 Indium Antimonide Films 235
4.2.2 Indium Arsenide Films 245
4.2.3 InAsxSbi_x Films 248
4.3.1 Gallium Arsenide Films 250
4.3.2 Gallium Phosphide and GaAsxPi_x Films 256
CHAPTER 5. DEVICES AND APPLICATIONS 260
5.1 Galvanomagnetic Devices 261
5.2 TFT and Field-effect Transistors 282
5.3 Diodes and Junction Transistors 287
CHAPTER 6. MEASUREMENT TECHNIQUES 320
6.1 Thickness and Topographic Methods 321
6.2 Resistivity Measurements 330
6.3.1 Hall Effect Measurements 339
6.3.2 Impurity Profiles 343
6.4.1 X-ray Diffraction Methods 350
6.4.2 X-ray Line-profile and Topographic Methods 354
6.5.1 Light Figures 356
6.6.1 Electron Diffraction and Electron Microscopy 359
6.6.2 The Scanning Electron Microscope 362
6.7 Electrodes and Ohmic Contacts 364
6.8 Etching 366
LIST OF SYMBOLS 370
BIBLIOGRAPHY 374
INDEX 390
| Erscheint lt. Verlag | 17.5.2014 |
|---|---|
| Sprache | englisch |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Elektrodynamik |
| Technik ► Maschinenbau | |
| ISBN-10 | 1-4831-8642-3 / 1483186423 |
| ISBN-13 | 978-1-4831-8642-9 / 9781483186429 |
| Haben Sie eine Frage zum Produkt? |
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