Surface Microscopy with Low Energy Electrons (eBook)

Professor Ernst Bauer is a distinguished German-American physicist and surface scientist who has made fundamental contributions to the understanding of epitaxial growth and to the development of microscopy techniques. He is one of the founders of surface physics and the physics of thin films.In 1958 he derived the classification of the thin film growth mechanisms that provides the theoretical framework of epitaxy which is used worldwide to this day. In 1962 he invented LEEM (Low Energy Electron Microscopy), which came to fruition in 1985. In the late eighties/early nineties he extended the LEEM technique in two important directions by developing Spin-Polarized Low Energy Electron Microscopy (SPLEEM) and Spectroscopic Photo Emission and Low Energy Electron Microscopy (SPELEEM). The combination of these methods now allows a comprehensive (structural, chemical, magnetic and electronic) characterization of surfaces and thin films on the 10 nm scale.Ernst Bauer’s interest in the development of synchrotron radiation microscopy techniques and his involvement with the Synchrotron source Elettra in Trieste, Italy resulted in the development of the Nanospectroscopy beamline, which is today one of the leading synchrotron radiation microscopy facilities worldwide.His work directly or indirectly impacts many areas of modern materials science: surfaces, thin films, electronic materials and instrumentation. The invention and development of surface microscopy with slow electrons has revolutionized the study of surface science and thin film science.Ernst Bauer has authored or co-authored more than 450 publications (among them 85 review papers and book chapters) and one book ("Electron Diffraction: Theory, Practice and Applications", 1958, in German). His papers are widely cited.Numerous LEEM instruments are now installed and are operating in many laboratories and synchrotron radiation facilities around the world (USA, Europe, Asia and Australia). An important recognition for Ernst Bauer’s efforts in the field of surface microscopy is the increasing number of the scientists involved in LEEM research, which is reflected in the organization of bi-annual LEEM/PEEM workshops, the first of which was organized by Ernst Bauer and Anastassia Pavlovska in Arizona in 1998.Broad international collaboration is typical of Ernst Bauer’s research. He had longstanding scientific cooperations with NASA, University of Pretoria (South Africa), Synchrotron Radiation Source in Trieste (Italy), Poland, Ukraine, Bulgaria and Czech Republic. About 80 visiting scientists had a possibility to perform high quality research in his group in Germany. Presently he has collaborations with Japan, Poland, Italy, Germany and Hong Kong.The scientific achievements of Ernst Bauer have been multiply honored. He was the recipient of the E.W. Muller Award in 1985, the Gaede Prize of the German Vacuum Society in 1988, the Medard W. Welch Award of the American Vacuum Society in 1992, the Niedersachsenpreis for Science (Germany) in 1994, the BESSY Innovation Award on Synchrotron Radiation in 2004 and the very prestigious Davisson-Germer Prize of the American Physical Society in 2005. In 2003 Ernst Bauer received the first Award of the Japan Society of Promotion of Science's 141st Committee on Microbeam Analysis and was made an honorary member of this organization. He was elected a Member of the Goettingen Academy of Sciences in 1989, Fellow of the American Physical Society in 1991 and Fellow of the American Vacuum Society in 1994. In 2008 he was honored with a Humboldt Research Prize and Doctor Honoris Causa at the Marie Sklodovska-Curie University, Lublin, Poland. In 2012 he was appointed Fellow of Elettra Sincrotrone Trieste and in 2014 he received the Doctor Honoris Causa title from the University of Wrocław, Poland.More information can be found:on Ernst Bauer’s website at Arizona State Universityon Wikipedia: Ernst. G. Bauer 

Chapter 1. IntroductionAbstract1.1. The early years 1.2. The postwar revival References Chapter 2. Basic InteractionsAbstract2.1 Fundamental theories of electron emission2.2  Photoemission2.2.1  General considerations2.2.2  The free electron gas approximation2.2.3  Band structure UV photoemission2.2.4  Spin effects in UV photoemission2.2.5  Surface plasmon photoemission2.2.6  X-ray photoemission2.2.6.1  Photoelectron emission2.2.6.2  Secondary electron emission2.3  Electron reflection2.3.1  General considerations2.3.2  Elastic scattering2.3.3  Inelastic scattering2.3.4  Surface effects2.3.5  VLEED, LEETS, TCS2.3.6  Quantum well effects2.3.7  Other aspectsReferencesChapter 3. InstrumentationAbstract3.1  Instruments: from simple to complex3.1.1  PEEM3.1.2  LEEM3.1.3  Aberration-corrected instruments3.1.4  Spectroscopic imaging instruments3.1.5  Spin-resolved imaging instruments3.2  Components3.2.1  Objective lens and other axial-symmetric lenses3.2.2  Magnetic deflectors3.2.3  Electron mirrors3.2.4  Aberration correctors3.2.5  Energy filters3.2.6  Wien filters3.2.7  Photon sources3.2.8  Electron sources3.2.9  Other components (image detectors vacuum system including airlock and specimen preparation chamber, electronics)ReferencesChapter 4. Theory of image formationAbstract4.1 Introduction4.2  Wave propagation: The contrast transfer function4.2.1  Low energy electron microscopy. The wave amplitude|4.2.2  The image intensity4.2.3  Mirror electron microscopy4.2.4  Emission electron microscopy4.3  Through-focus series image improvement4.4  Information transfer in the image acquisition system4.5  Summary and outlookReferencesChapter 5. Applications in surface scienceAbstract5.1  Surface microstructure5.1.1 Metals5.1.2  Semiconductors5.1.2.1  Si(111)5.1.2.2  Si(100)5.1.2.3  Other Si surfaces5.1.3  Other inorganic semiconductor surfaces5.1.4  Other inorganic compound surfaces5.2  Adsorption5.2.1  Adsorption on metals5.2.1.1  Nonmetallic adsorbates5.2.1.2  Coadsorption and reaction: catalysis5.2.1.3  Metallic adsorbates5.2.2  Adsorption on Semiconductors5.2.2.1  Metallic adsorbates5.2.2.2  Nonmetallic adsorbates5.3  Film growth and structure5.3.1  Films on semiconductors5.3.1.1  Metal films5.3.1.2  Ge on Si5.3.1.3  Other films on semiconductors5.3.1.4  Nanostructures and droplets on semiconductors5.3.2  Films on metals5.3.2.1  Metal films5.3.2.2  Inorganic compound films5.3.3  Organic filmsReferencesChapter 6. Applications in other fieldsAbstract6.1 Graphene6.1.1  Introduction6.1.2  Graphene on SiC6.1.2.1  Growth and microstructure6.1.2.2  Intercalation6.1.3  Graphene on metals6.1.3.1  Introduction6.1.3.2  Growth and microstructure6.1.3.3  Intercalation6.2  Plasmons6.2.1  Introduction6.2.2  Linear structures6.2.3  Nanostructures6.2.4  Complex wave fields6.2.5  Limitations6.3  Technological applications6.3.1  General materials applications6.3.2  Electronics6.4  Biology6.5  A multimethod case studyReferencesChapter 7. Magnetic imagingAbstract7.1  Introduction7.2  Ferromagnetic films7.2.1  Single layers7.2.2  Quantum well effects7.2.3  Bilayers7.2.4  Trilayers7.2.5  Multilayers7.2.6  Compound layers7.3  Bulk magnetic materials7.3.1  Ferromagnetic materials7.3.2  Antiferromagnetic materials7.4 Ferromagnetic-antiferromagnetic interfaces7.5 Nanostructures7.5.1  Introduction7.5.2  Static domain structure7.5.3  Field and current influence7.5.4  Nanodots and nanostructure arrays7.6. Ferroelectrics / Multiferroics7.6.1  Ferroelectries7.6.2  MultiferroicsChapter 8. Other surface imaging methods with electronsAbstract8.1 Scanning Low Energy Electron Microscopy8.2  Scanning Low Energy Electron Diffraction Microscopy8.3  Reflection Electron Microscopy8.4  Secondary and Auger Electron Microscopy8.5  Scanning Electron Microscopy with Spin Analysis8.6  Scanning Photoelectron Emission Microscopy8.7 Concluding remarks