Intense Electron and Ion Beams (eBook)

Preface 5
Contents 7
1 Introduction to Particle-Beam Formation 13
1.1 Application and Parameters of Intense Charged- Particle Beams 13
1.2 Optical Systems of Electron Devices 16
1.3 Focusing System of Electron Devices 21
1.4 Optical Systems of Particle-Beam Technology 26
1.5 Ion Optical Systems 28
2 Methods of Fields Calculation 30
2.1 General Equations of Electrostatic Fields 30
2.2 Electrostatic Field Calculation. Dirichlet Problem 31
2.3 Calculation of Electrostatic Field: Cauchy Problem 41
2.4 Computer Calculation of Electrostatic Fields 47
2.5 General Equations of Magnetic Field 54
2.6 Numerical Calculation of Magnetic Field 58
3 Fundamentals of Charged-Particle Motion 65
3.1 Equations of Motion in Newton Form 65
3.2 Law of Energy Conservation 66
3.3 Lagrange Equations of Motion 68
3.4 Hamilton Equations 69
3.5 Hamilton–Jacobi Equation 70
3.6 Equations of Motion in Axially Symmetric Fields 72
3.7 Motion in Planar Two-Dimensional Fields 83
3.8 Numerical Calculation of Charged- Particle Trajectories 84
3.9 Electrostatic Charged-Particle Lenses 87
3.10 Magnetic Lenses 96
4 Motion of Intense Charged-Particle Beams 105
4.1 Peculiarities of Intense Particle-Beam Motion 105
4.2 Simplified Models of Charged-Particle Beams 108
4.3 Methods of Solution of Motion Equations 112
4.4 Approximate Method of Space-Charge Account 115
4.5 Motion of Charge-Beams in Channels Free from External Fields 117
4.6 Influence of Residual Gases on Electron- Beam Motion 120
4.7 Estimation of Effect of Thermal Electron Velocities 127
4.8 Methods of Solution of Self-Consistent Problems 131
5 Electron Guns 134
5.1 The Problem of Electron-Beam Formation 134
5.2 Guns for Formation of Strip Beams 135
5.3 Guns for Solid Axially Symmetric Beams 142
5.4 Guns for Formation of Hollow Axisymmetric Beams 150
5.5 Electron Guns with Beam-Current Control 154
5.6 Principle of Computer-Aided Design of Electron Guns 160
6 Electron and Ion Sources with Field and Plasma Emitters 165
6.1 Some Peculiarities of Field and Plasma Emitters 165
6.2 Low-Current Field-Emission Guns 165
6.3 Multiple-Tip Field-Emission Cathodes 167
6.4 High-Current Electron Sources with Explosive Emission 168
6.5 Liquid-Metal Emitters 168
6.6 Plasma Sources of Charged Particles 169
6.7 Extracting of Charge Particles and Beam Forming 173
7 Magnetic Focusing Systems 176
7.1 Focusing Systems with Uniform Field 176
7.2 Systems of Reversed- and Periodic-Field Focusing 188
7.3 Focusing of Hollow Beams in Uniform Field 195
7.4 Focusing of Strip Beams 200
7.5 Computer-Aided Design of Magnetic Systems 203
8 Electrostatic Focusing Systems 205
8.1 Focusing System for Solid Axially Symmetrical Beams 205
8.2 Systems for Focusing of Strip Beams 216
8.3 Focusing Systems for Hollow Beams 217
9 Optical Systems of Technological Installations 220
9.1 Electron Probe of Welding Installation 220
9.2 Optical System for Electron-Beam Lithography 224
9.3 Ion Probes 226
10 Intense Relativistic Charged- Particle Beams 228
10.1 Relativistic Equations of Motion 228
10.2 Intense Relativistic Beams in Vacuum Channels 230
10.3 Neutralized Relativistic Beams 237
10.4 Beam-Motion Computation 237
11 Multiple-Beam Electron-Optical Systems 242
11.1 Peculiarities and Application of Multiple Beams 242
11.2 Multiple-Beam Guns and Magnetic Systems 244
11.3 Peculiarities of Multiple Systems 248
11.4 Estimation of Effects of Transverse Fields 253
11.5 Analysis of Beam Interaction 255
12 Methods of Experimental Investigation of Beams 260
12.1 Classification of Methods 260
12.2 The Pin-Hole Chamber Method 263
12.3 Application of Modified Pin-Hole Chamber 266
Appendix 270
Emittance and Brightness 270
References 274
Index 283