Particles on Surfaces I

I. General Papers.- Fine Particles on Semiconductor Surfaces: Sources, Removal and Impact on the Semiconductor Industry.- Cleaning Semiconductor Surfaces: Facts and Foibles.- Effect of Chemical Cleaning Sequencing on Particle Addition/Reduction on Silicon Wafers.- Measuring Aerosol Particle Concentration in Clean Rooms and Particle Areal Density on Silicon Wafer Surfaces.- Particulate Contamination on Wafer Surfaces Resulting From Hexamethyldisilazane/Water Interactions.- Contamination of Chip Surfaces by Particles During Destructive Physical Analysis of Integrated Circuit Devices.- Calculation of Hamaker Coefficients for Metallic Aerosols from Extensive Optical Data.- Soiling Mechanisms and Performance of Anti-Soiling Surface Coatings.- Implications of Particulate Contamination in the Performance of Floppy Disks.- II. Particle-Substrate Interaction and Particle Adhesion.- A Theoretical Review of Particle Adhesion.- The Electrostatic Force on a Dielectric Sphere Resting on a Conducting Substrate.- Electrostatic Charge Generation on Wafer Surfaces and Its Effect on Particulate Deposition.- Toner Adhesion in Electrophotography.- Adhesion and Removal of Particles: Effect of Medium.- Strong Adhesion of Dust Particles.- Prevention of Strong Adhesion of Dust Particles.- Dynamic Adhesion of Particles Impacting a Cylinder.- Crossed Fiber Models of the Particle-Surface Interaction.- Sensitive New Method for the Determination of Adhesion Force Between a Particle and a Substrate.- III. Particle Detection, Analysis and Characterization.- Detection of Particles on Clean Surfaces.- Detection of Particles Down to a "Few" Micrometers on Non-Specular Microelectronic Substrates and Other Surfaces.- Accurate Particle Counting for Bare Substrate Inspection.- Automated SEM/EDS Image Analysis of Particles on Filter Blanks.- Particle Sizing and Counting with the Inspex EX20/20.- IV. Particle Removal.- Methods for Surface Particle Removal: A Comparative Study.- Electrostatic Removal of Particles from Surfaces.- Electric Field Detachment of Charged Particles.- A New Approach to the Removal of Sub-Micron Particles From Solid (Silicon) Substrates.- About the Contributors.