Chemical Vapor Deposition Polymerization - Jeffrey B. Fortin,  Toh-Ming Lu

Chemical Vapor Deposition Polymerization

The Growth and Properties of Parylene Thin Films
Buch | Softcover
102 Seiten
2010 | Softcover reprint of hardcover 1st ed. 2004
Springer-Verlag New York Inc.
978-1-4419-5413-8 (ISBN)
106,99 inkl. MwSt
Chemical Vapor Deposition Polymerization - The Growth and Properties of Parylene Thin Films is intended to be valuable to both users and researchers of parylene thin films. It should be particularly useful for those setting up and characterizing their first research deposition system. It provides a good picture of the deposition process and equipment, as well as information on system-to-system variations that is important to consider when designing a deposition system or making modifications to an existing one. Also included are methods to characterizae a deposition system's pumping properties as well as monitor the deposition process via mass spectrometry. There are many references that will lead the reader to further information on the topic being discussed.
This text should serve as a useful reference source and handbook for scientists and engineers interested in depositing high quality parylene thin films.

1. Introduction.- 2. Deposition Equipment.- 3. Step-by-Step Guide to Depositing Parylene.- 4. Parylene-N Precursor Chemistry.- 5. Deposition Kinetics for Polymerization via the Gorham Route.- 6. Film Properties.- 7. Other CVD Polymers.- References.

Erscheint lt. Verlag 3.12.2010
Zusatzinfo XVII, 102 p.
Verlagsort New York, NY
Sprache englisch
Maße 155 x 235 mm
Themenwelt Naturwissenschaften Chemie Technische Chemie
Naturwissenschaften Physik / Astronomie Atom- / Kern- / Molekularphysik
Naturwissenschaften Physik / Astronomie Festkörperphysik
Naturwissenschaften Physik / Astronomie Theoretische Physik
Technik Maschinenbau
ISBN-10 1-4419-5413-9 / 1441954139
ISBN-13 978-1-4419-5413-8 / 9781441954138
Zustand Neuware
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