Physics of Thin Films
Springer-Verlag New York Inc.
978-1-4615-7591-7 (ISBN)
1. Introduction.- 2. Methods of Preparation of Thin Films.- 2.1 Chemical and Electrochemical Methods.- 2.2 Cathode Sputtering.- 2.3 Vacuum Evaporation.- 3. Thin Film Thickness and Deposition Rate Measurement Methods.- 3.1 Balance Methods.- 3.2 Electrical Methods.- 3.3 Optical Methods.- 3.4 Deposition Rate Monitoring Using Transfer of Momentum.- 3.5 Special Thickness Monitoring Methods.- 4. Mechanism of Film Formation.- 4.1 Formation Stages of Thin Films.- 4.2 Nucleation.- 4.3 Growth and Coalescence of Islands.- 4.4 Influence of Various Factors on Final Structure of Film.- 4.5 Crystallographic Structure of Thin Films.- 4.6 Epitaxial Films.- 5. Composition, Morphology and Structure of Thin Films.- 5.1 Methods for Determination of Chemical Composition of Films.- 5.2 Electron Microscopy of Thin Films.- 5.3 Diffraction of Electrons.- 5.4 X-ray Methods.- 5.5 Auger Spectroscopy.- 6. Properties of Thin Films.- 6.1 Mechanical Properties.- 6.2 Electrical and Magnetic Properties of Thin Films.- 6.3 Optical Properties of Thin Films.- 7. Application of This Films.- 7.1 Optical Applications.- 7.2 Applications in Electronics.- References.
Zusatzinfo | 254 p. |
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Verlagsort | New York, NY |
Sprache | englisch |
Maße | 152 x 229 mm |
Themenwelt | Naturwissenschaften ► Chemie ► Analytische Chemie |
Naturwissenschaften ► Physik / Astronomie ► Atom- / Kern- / Molekularphysik | |
Naturwissenschaften ► Physik / Astronomie ► Festkörperphysik | |
Naturwissenschaften ► Physik / Astronomie ► Theoretische Physik | |
Technik ► Maschinenbau | |
ISBN-10 | 1-4615-7591-5 / 1461575915 |
ISBN-13 | 978-1-4615-7591-7 / 9781461575917 |
Zustand | Neuware |
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