Nonlinear Super-Resolution Nano-Optics and Applications
Springer Berlin (Verlag)
978-3-662-52573-9 (ISBN)
This book covers many advances in the subjects of nano-optics and nano photonics. The author describes the principle and technical schematics of common methods for breaking through the optical diffraction limit and focuses on realizing optical super-resolution with nonlinear effects of thin film materials. The applications of nonlinear optical super-resolution effects in nano-data storage, nanolithography, and nano-imaging are also presented.
This book is useful to graduate students majoring in optics and nano science and also serves as a reference book for academic researchers, engineers, technical professionals in the fields of super-resolution optics and laser techniques, nano-optics and nano photonics, nano-data storage, nano imaging, micro/nanofabrication and nanolithography and nonlinear optics.
Jingsong Wei received his PhD from Chinese Academy of Sciences. He has about 20 years’ research experience in nonlinear nano-optics and nano photonics, phase change thin films, high-density data storage, nanolithography and high-resolving optical imaging. He has published more than 100 papers in peer-reviewed journals and international conference proceedings. He is a full-time professor of Shanghai Institute of Optics and Fine Mechanics (SIOM) of Chinese Academy of Sciences (CAS) and a professor at University of Chinese Academy of Sciences.
General methods for obtaining nanoscale light spot.- Third-order nonlinear effects.- Characterization methods for nonlinear absorption and refraction coefficients.- Optical nonlinear absorption and refraction of semiconductor thin films.- Nanoscale spot formation through nonlinear refraction effect.- Optical super-resolution effect through nonlinear saturation absorption.- Resolving improvement by combination of pupil filters and nonlinear thin films.- Applications of nonlinear super-resolution thin films in nano-optical data storage.- Applications of nonlinear super-resolution effect in nanolithography and high resolving light imaging.- Remarkings.
| Erscheinungsdatum | 19.08.2016 |
|---|---|
| Reihe/Serie | Springer Series in Optical Sciences |
| Zusatzinfo | XI, 256 p. 176 illus., 48 illus. in color. |
| Verlagsort | Berlin |
| Sprache | englisch |
| Maße | 155 x 235 mm |
| Themenwelt | Naturwissenschaften ► Physik / Astronomie ► Optik |
| Technik ► Elektrotechnik / Energietechnik | |
| Schlagworte | Applied Optics • Electronic devices and materials • Laser technology and holography • Laser Technology, Photonics • Nanolithography Reviewed • Nano-optical Data Storage • Nanoscale Nonlinear Thin Films • nanoscale science and technology • nanotechnology • Nanotechnology and Microengineering • Nonlinear absorption • Nonlinear refraction • optical and electronic materials • Optical Nonlinearity • optical physics • Optical Super-resolution • Optics, Optoelectronics, Plasmonics and Optical De • other manufacturing technologies • Physics and Astronomy |
| ISBN-10 | 3-662-52573-9 / 3662525739 |
| ISBN-13 | 978-3-662-52573-9 / 9783662525739 |
| Zustand | Neuware |
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