Particles on Surfaces 2

I. Particle-Substrate Interaction, Deposition and Adhesion.- The Adhesion of Small Particles to a Surface.- Application of Impact Adhesion Theory to Particle Kinetic Energy Loss Measurements.- Adhesion Force Due to a Meniscus in a Crossed-Fiber System.- Adhesion Induced Deformations Between Particles and Substrates.- The Effect of External Noises on the Attachment of Particles to Solid Surfaces.- Measurement of Detachable Submicrometer Particles and Surface Cleanliness of Clean Room Garments.- Accumulation of Particle Derived Ionic Contaminants on Electronic Equipment: Airbone Concentrations and Deposition Velocities.- Adhesion of Ash Particles on Heat Transfer Surfaces in Coal Combustion Applications: Mechanisms and Implications.- Factors Affecting Adhesion of Drug Particles to Surfaces in Pharmaceutical Systems.- II. Particle Detection, Analysis and Characterization.- The Role of Infrared and Raman Microspectroscopies in the Characterization of Particles on Surfaces.- Infrared and Raman Microspectroscopy: An Overview of Their Use in the Identification of Microscopic Particulates.- Particle Identification by Auger Electron Spectroscopy.- Identification and Characterization of Normetallic Particulate Contamination Removed from Aerospace Components.- Surface Particle Inspection Plans in Semiconductor Manufacturing.- Particulate Generation and Detection on Surfaces.- Identification of Small Particles on a Silicon Wafer.- The Evaluation of PWA and SMA Cleanliness Levels for “In-Line” Defluxing by High Performance Liquid Chromatography.- III. Particle Prevention and Implications.- Wear Resistant Coatings Reduce Particulate Contamination in a Magnetic Disk Drive.- Particle Reduction on Silicon Wafers as a Result of Isopropyl Alcohol Vapor Displacement Drying after WetProcessing.- Implications of Particle Contamination for Thin Film Growth.- Implications of Particulate Contamination in E-Beam Lithography.- IV. Particle Removal.- Enhanced Removal of Sub-Micron Particles from Surfaces by High Molecular Weight Fluorocarbon Surfactant Solutions.- Comparison of Freon with Water Cleaning Processes for Disk-Drive Parts.- Ultrasonic and Hydrodynamic Techniques for Particle Removal from Silicon Wafers.- New Sonic Cleaning Technology for Particle Removal from Semiconductor Surfaces.- About the Contributors.