Microscopy of Semiconducting Materials -

Microscopy of Semiconducting Materials

Proceedings of the 14th Conference, April 11-14, 2005, Oxford, UK
Buch | Softcover
XVI, 540 Seiten
2010 | 2005
Springer Berlin (Verlag)
978-3-642-06870-6 (ISBN)
279,99 inkl. MwSt

This is a long-established international biennial conference series, organised in conjunction with the Royal Microscopical Society, Oxford, the Institute of Physics, London and the Materials Research Society, USA. The 14th conference in the series focused on the most recent advances in the study of the structural and electronic properties of semiconducting materials by the application of transmission and scanning electron microscopy. The latest developments in the use of other important microcharacterisation techniques were also covered and included the latest work using scanning probe microscopy and also X-ray topography and diffraction. Developments in materials science and technology covering the complete range of elemental and compound semiconductors are described in this volume.

Epitaxy: Wide Band-Gap Nitrides.- Epitaxy: Silicon-Germanium Alloys.- Epitaxy: Growth and Defect Phenomena.- High Resolution Microscopy and Nanoanalysis.- Self-Organised and Quantum Domain Structures.- Processed Silicon and Other Device Materials.- Device Studies.- Scanning Electron and Scanning Probe Advances.

Erscheint lt. Verlag 19.10.2010
Zusatzinfo XVI, 540 p.
Verlagsort Berlin
Sprache englisch
Maße 155 x 235 mm
Gewicht 892 g
Themenwelt Technik Maschinenbau
Schlagworte Electron Microscope • electron microscopy • Integrated circuit • nanostructures • plasma processing • Scanning Probe Microscopy • semiconductor materials • Transmission Electron Microscopy
ISBN-10 3-642-06870-7 / 3642068707
ISBN-13 978-3-642-06870-6 / 9783642068706
Zustand Neuware
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