Application of Particle and Laser Beams in Materials Technology

I. Fundamentals.- Fundamental Aspects of Ion Electron Interactions.- Fundamentals of Ion-Solid Interactions: Atomic Collisions.- Excitation and Ionization In Fast Ion-Atom Collisions Due To Projectile-Electron — Target-Electron Interactions.- Radiation Induced Point Defects and Diffusion.- High Temperature Oxidation and Corrosion of Metals and Alloys: Fundamentals and Influence of High Energy Beams.- Thin Films of High-Temperature Superconductors: Application-Oriented Studies of Growth and Properties.- II. Surface Analysis Techniques.- An Overview of Surface Analysis. Application to the Adsorption of Li on Single Crystals of Layered Compounds.- Depth Profiling in Combination with Sputtering.- A SIMS Study of the Inter-Diffusion of Group III Atoms in a Distributed Bragg Reflector.- Thermal He-Atom Scattering for the Study of Surface Systems: K on Si(001).- Experimental and Monte-Carlo Simulation Studies of the Surface Concentration Changes in ZrO2 under Ion Bombardment.- Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics.- III. Laser Beams in Materials Technology.- The Raman Approach to Materials Science.- Laser-Material Interaction. Plasma Formation and Applications.- Optical Spectrometry Coupled with Laser Ablation for Analytical Applications on Solids.- In Situ Laser Beam Probes for Semiconductor Processing.- Laser Deposition and Patterning of Diamond Films.- Laser-Raman Spectroscopy of Some Lanthanide/Hgl2 Heterometallic Complexes (HL=5,7-Dimethyl-1,8-Naphthyridine-2-OL).- IV. Accelerator-Based Techniques in Materials Technology.- Accelerators in Materials Research.- Application of Elastic Recoil Detection in Materials Analysis.- Applications of High Energy Ion Scattering in Materials Science.- High Energy HeavyIon RBS, ERDA and Channelling.- Some New Detection Techniques for Light-Ion Scattering Analysis.- Prompt Gamma-Ray Resonant Nuclear Reaction Analysis for Light Elements: H, Li, F and Na.- Quantitative Determination of Light Elements in Semiconductor Matrices by Charged Particle Activation Analysis.- Thin Layer Activation in Materials Technology.- Optimum Industrial Application of the Thin Layer Activation Technique.- Ion Beam Analysis of Glasses — Industrial Applications.- Nuclear Reaction Analysis of Corroded Glass Surfaces.- Ion-Beam Archaeometry: Technological Assessment of Ancient and Medieval Materials.- Non-Destructive Analysis Of American Gold Jewellery Items By PIXE, RBS and PIGE.- Recoil Spectrometry: A Suitable Method for Studying Interfacial Reactions in Metal-InP Systems.- Bismuth-Implanted Silicon Reference Material Revisited: The Concept of Traceability and the Individual Characterisation of Chips.- Energy Dispersive X-Ray Analysis of the Tin Distribution on Electrolytically Coloured Anodised Aluminium.- Determination of Sulphur and Copper Distribution on Chemically Modified HEU-Type Zeolite Crystals by Means of Nuclear Resonant Reaction Analysis Techniques, Scanning Electron Microscopy and X-Ray Fluorescence.- Modern Technological Projects with High Power Electron Beams.- Computer-Aided Design of Technological Electron-Optical Systems.- Ion Beam Mixing.- Materials Modification Using Electron Beams.- Deposition and Etching Mechanisms in Plasma Thin Film Processes.- Active Modification and Amorphisation of Materials by Low-Energy Ion Irradiation.- SIMOX Thin Films. Structural and Electrical Characterisation using FTIR Spectroscopy.- The Key Role of Electron Beams in IC Technology.- Cadmium Sulphide Microcrystallite-Doped Silicon Dioxide Thin FilmsPrepared by RF-Sputtering: Growth and Physical Characterisation.- VI. Synchrotron Radiation.- Synchrotron Radiation Sources for Materials Technology.- Photoemission and EXAFS Study of Na on 2H-TaS2.- Characterisation of Nearly Stoichiometric Buried SixNy Films with EXAFS and NEXAFS.- List of Contributors.- List of Participants.