Advances in Crystal Growth Research (eBook)

Cover 1
Contents 10
Preface 6
Acknowledgements 8
Chapter 1. Crystal growth–Its significance for modern science and technology and its possible future applications 16
1. Introduction 16
2. Morphology and crystal growth 18
3. Synthesis of single crystals 20
4. Surface and interface 22
5. Lattice defects 23
6. Synthesis of dislocation-free crystals 25
7. Vapor growth and epitaxy 26
8. Computer simulation 27
9. Biomineralization and biocrystallization 27
10. Concluding remarks (future targets) 29
Part 1: Understanding of Fundamental Aspects in Crystal Growth 34
Chapter 2. Fundamentals of phase field theory 36
1. Introduction 36
2. Monocomponent system 37
3. Anisotropy 44
4. Alloys 48
5. Hydrodynamics 53
6. Conclusions 53
Chapter 3. Generic mechanism of heterogeneous nucleation and molecular interfacial effect 57
1. Introduction 57
2. Nucleation barrier 57
3. Nucleation kinetics 63
4. Interfacial effects of foreign body and fluid molecules 67
5. Heterogeneous two-dimensional nucleation growth 73
6. General remarks and conclusions 75
Chapter 4. Challenges in crystal growth science and the microgravity tool 77
1. Opportunities 77
2. What is missing in crystal growth science? 78
3. Surface processes vs. bulk diffusion and convection. Dendrites 78
4. Pattern formation 81
5. Ripening 82
6. Detached growth 83
7. Biomacromolecular crystallization 85
8. Conclusion 89
Chapter 5. Surface step dynamics: basic concepts, theory and simulation 93
1. Basic idea of step models 93
2. Step dynamics in a vicinal face 97
3. Relaxation of mesoscopic structures 106
Chapter 6. Surface step dynamics: experimental observations 115
1. Introduction 115
2. Experimental 116
3. Equilibrium shape (macroscopic approach) 118
4. Thermal fluctuation of steps (microscopic approach) 121
5. Mechanism of mass transport for step fluctuation 123
6. Conclusion 123
Chapter 7.Elementary growth process in semiconductor epitaxy–Molecular beam epitaxy as an example of epitaxy 125
1. Introduction 125
2. Incorporation diffusion length 126
3. Intersurface diffusion 129
4. Elementary growth processes 130
5. Fabrication of microstructures 132
6. Microchannel epitaxy by low angle incidence beam MBE 137
7. Elimination of the growth on (111) facet adjacent to (001) facet 140
8. Conclusions 141
Chapter 8. Atomistic simulation of epitaxial growth processes 144
1. Introduction 144
2. Computational methods 145
3. Role of electrons on the surface 152
4. Epitaxial growth simulation 156
5. Summary 162
Part 2: Materials Design and Functionality of Advanced Materials 168
Chapter 9. Si bulk crystal growth: what and how? 170
1. Introduction 170
2. Magnetic field-applied crystal growth 171
3. Actual system 173
4. Summary 180
Chapter 10. Optimization of melt growth processes by experimental analysis and computer modeling 182
1. Introduction 182
2. Strategy of process optimization in crystal growth 182
3. Important features of industrial melt growth processes 184
4. Physico-chemical model 186
5. Numerical treatment 190
6. Verification of numerical models by model experiments 193
7. Process optimization 199
8. Conclusion 204
Chapter 11. Epitaxial lateral overgrowth of GaN 206
1. Introduction 206
2. Growth procedure 207
3. ELO process 207
4. Dislocation behavior in FIELO-GaN 208
5. Characteristics of FIELO-GaN 216
6. Conclusion 222
Chapter 12. Effects of buffer layer and advanced technology on heteroepitaxy of GaN 225
1. Introduction 225
2. Metalorganic vapor phase epitaxy (MOVPE) 226
3. Hybrid vapor phase epitaxy (HVPE) 241
4. Summary 245
Chapter 13. Self-assembled quantum dots systems: the case of GaN 248
1. Introduction 248
2. Growth mode of GaN 249
3. Kinetics of GaN growth 257
4. Emission properties of GaN QDs 263
5. Conclusion 265
Chapter 14. Self-organised growth of silicon nanocrystals in nanocrystalline-Si/Sio2 superlattices 267
1. Introduction 267
2. Controlled crystallization of nanometer of thick a-Si layers A novel growth technique
3. Preparation and characterization 270
4. Vibrational properties 271
5. Photoluminescence 274
6. Carrier tunneling 276
7. Conclusion 278
Chapter 15. Growth and characterization of semiconductor silicon carbide for electronic and optoelectronic applications: An industrial perspective 281
1. Introduction 281
2. SiC crystal growth 283
3. Crystallographic defects 287
4. Crystal purity 292
5. Summary 295
Chapter 16. Crystal growth of SiC II. Epitaxial growth 297
1. Introduction 297
2. Step-controlled epitaxy of SiC 298
3. Growth mechanism of step-controlled epitaxy 300
4. Step kinetics in SiC epitaxy 306
5. Characterization of epitaxial layers 308
6. In situ doping of impurities 311
7. Recent progress 313
8. Summary 314
Chapter 17. Crystal growth and characterization of magnetic semiconductors 318
1. Introduction 318
2. Magnetic semiconductors of the first generation 319
3. II-VI-based diluted magnetic semiconductors 321
4. III-V-based diluted magnetic semiconductors 324
5. Ferromagnetic/semiconductor hybrids 328
6. Chalcopyrite type magnetic semiconductors 330
7. ZnO-based magnetic semiconductors 332
8. Conclusion 332
Chapter 18. X-ray characterization of epitaxial layers 335
1. Introduction 335
2. Lattice distortion and symmetric/asymmetric reflections 335
3. Atomic layer characterization by X-ray crystal truncation rod scattering 338
4. Conclusions 350
Chapter 19. Principles and applications of optical crystals their stoichiometry study
1. Introduction 352
2. What is the optical crystal? 352
3. Functions of optical crystals in applications 355
4. Basic study for the growth of optical crystals 356
5. Summary 361
Part 3: Dynamics of crystal-liquid interface 364
Chapter 20. Surface X-ray diffraction studies of crystal growth 366
1. Introduction 366
2. Surface X-ray diffraction 366
3. Epitaxial growth 369
4. Solution growth 371
5. Conclusions 374
Chapter 21. Using atomic force microscopy to investigate solution crystal growth 376
1. Introduction 376
2. Design and operation of the AFM 377
3. Ex-situ experiments 380
4. In-situ experiments 381
5. Conclusions 391
Chapter 22. Crystal morphology control with tailor-made additives A tereochemical approach
1. Introduction 396
2. Crystal morphology engineering 396
3. Tailor-made inhibitors for resolution of racemates 398
4. Effect of tailor-made additives on growth of polar crystals 401
5. Effect of tailor-made additives on growth of centrosymmetric crystals 405
6. Tailor made additives as enantioselective nucleation promoters 412
7. Control of crystalline phase formation 414
8. Conclusions 415
Chapter 23. Crystal engineering of biological soft materials 416
1. Introduction 416
2. Key concepts in crystal engineering 417
3. Crystallization of amino acid in W/O microemulsion 422
4. Template-accelerated solvent crystallization 425
5. Template-accelerated crystallization in O/W emulsion 428
6. Conclusion 432