Metal-Dielectric Interfaces in Gigascale Electronics

Thermal and Electrical Stability

, (Autoren)

Buch | Hardcover
149 Seiten
2011
Springer-Verlag New York Inc.
978-1-4614-1811-5 (ISBN)

Lese- und Medienproben

Metal-Dielectric Interfaces in Gigascale Electronics - Ming He, Toh-Ming Lu
139,09 inkl. MwSt
Metal-dielectric interfaces are ubiquitous in modern electronics.

Metal-Dielectric Interfaces in Gigascale Electronics provides a unifying approach to the diverse and sometimes contradictory test results that are reported in the literature on metal-dielectric interfaces.
Metal-dielectric interfaces are ubiquitous in modern electronics. As advanced gigascale electronic devices continue to shrink, the stability of these interfaces is becoming an increasingly important issue that has a profound impact on the operational reliability of these devices. In this book, the authors present the basic science underlying  the thermal and electrical stability of metal-dielectric interfaces and its relationship to the operation of advanced interconnect systems in gigascale electronics. Interface phenomena, including chemical reactions between metals and dielectrics, metallic-atom diffusion, and ion drift, are discussed based on fundamental physical and chemical principles. Schematic diagrams are provided throughout the book to illustrate  interface phenomena and the principles that govern them.

Metal-Dielectric Interfaces in Gigascale Electronics  provides a unifying approach to the diverse and sometimes contradictory test results that are reported in the literature on metal-dielectric interfaces. The goal is to provide readers with a clear account of the relationship between interface science and its applications in interconnect structures. The material presented here will also be of interest to those engaged in field-effect transistor and memristor device research, as well as university researchers and industrial scientists working in the areas of electronic materials processing, semiconductor manufacturing, memory chips, and IC design.

Preface.- 1. Introduction.- 2. Metal-Dielectric Diffusion Processes: Fundamentals.- 3. Experimental Techniques.- 4. Al-Dielectric Interfaces.- 5. Cu-Dielectric Interfaces.- 6. Barrier Metal-Dielectric Interfaces.- 7. Self-Forming Barriers. 8. Kinetics of Ion Drift.- 9. Time-Dependent Dielectric Breakdown (TDDB) and Future Directions.

Reihe/Serie Springer Series in Materials Science ; 157
Zusatzinfo XI, 149 p.
Verlagsort New York, NY
Sprache englisch
Maße 155 x 235 mm
Themenwelt Naturwissenschaften Chemie Physikalische Chemie
Naturwissenschaften Physik / Astronomie Festkörperphysik
Technik Elektrotechnik / Energietechnik
Technik Maschinenbau
Schlagworte cu interconnect technology • Flatband voltage shifts in metal-dielectric- • Fundamental science metal-dielectric interfaces • Low-k dielectrics • Metal atom diffusion and metal ion drift in dielectrics • Metal-dielectric interface • Metal-dielectric interfaces book • Metal-dielectric interfaces experimental techniques • Metal-dielectric interfaces stability • Metal-dielectric interfaces stability book • semiconductor capacitors • Thermal and electric stability of metal-dielectric interfaces
ISBN-10 1-4614-1811-9 / 1461418119
ISBN-13 978-1-4614-1811-5 / 9781461418115
Zustand Neuware
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