Rapid Thermal Processing of Semiconductors - Victor E. Borisenko, Peter J. Hesketh

Rapid Thermal Processing of Semiconductors

Buch | Hardcover
358 Seiten
1997
Kluwer Academic/Plenum Publishers (Verlag)
978-0-306-45054-9 (ISBN)
235,39 inkl. MwSt
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Rapid thermal processing has contributed to the development of single wafer cluster processing tools and other innovations in integrated circuit manufacturing environments. Borisenko and Hesketh review theoretical and experimental progress in the field, discussing a wide range of materials, processes, and conditions. They thoroughly cover the work of international investigators in the field.

1. Transient Heating of Semiconductors by Radiation.- 2. Recrystallization of Implanted Layers and Impurity Behavior in Silicon Crystals.- 3. Crystallization, Impurity Diffusion, and Segregation in Polycrystalline Silicon.- 4. Component Evaporation, Defect Annealing, and Impurity Diffusion in the III–V Semiconductors.- 5. Diffusion Synthesis of Silicides in Thin-Film Metal—Silicon Structures.- 6. Rapid Thermal Oxidation and Nitridation.- 7. Rapid Thermal Chemical Vapor Deposition.- References.

Reihe/Serie Microdevices
Zusatzinfo XXII, 358 p.
Verlagsort New York
Sprache englisch
Maße 178 x 254 mm
Themenwelt Naturwissenschaften Chemie Analytische Chemie
Naturwissenschaften Physik / Astronomie Festkörperphysik
Technik Elektrotechnik / Energietechnik
Technik Maschinenbau
ISBN-10 0-306-45054-2 / 0306450542
ISBN-13 978-0-306-45054-9 / 9780306450549
Zustand Neuware
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